Compositions for dark-field polymerization and method of...

Plastic and nonmetallic article shaping or treating: processes – Mechanical shaping or molding to form or reform shaped article – Shaping against forming surface

Reexamination Certificate

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Details

C264S494000, C264S496000, C264S293000, C264S284000, C264S319000, C522S031000, C430S270100

Reexamination Certificate

active

07906060

ABSTRACT:
The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.

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