Compositions and process

Details Compositions and process Compositions and process

1983-10-11

1985-05-21

Lieberman, Allan M.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415923, 430919, 430920, 502167, C08F 248, C08J 228

Patent

active

045184739

ABSTRACT:
The photopolymerization of ethylenically unsaturated compounds is effected using a combination of an aromatic ketone photosensitizer and a tetrasubstituted urea (e.g. N,N,N',N'-tetramethylurea) or N,N-disubstituted acid amide. Storage stable liquid photoinitiator compositions comprising an aromatic ketone sensitizer (e.g. benzophenone) and a tetrasubstituted urea (e.g. N,N,N',N'-tetramethylurea) are also disclosed. The use of the tetrasubstituted urea or N,N-disubstituted amide possesses advantages (storage stability, lack of discoloration on curing) over photosensitizers such as Michler's ketone which have been used previously in combination with aromatic ketone photosensitizers.

REFERENCES:
patent: 3923703 (1975-12-01), Fukutani et al.
patent: 3933885 (1976-01-01), Satomura
patent: 3993549 (1976-11-01), Bush et al.
patent: 4088554 (1978-05-01), Felder et al.
patent: 4110188 (1978-08-01), Darms et al.
patent: 4153525 (1979-05-01), Araki et al.
patent: 4222835 (1980-09-01), Dixon
patent: 4227979 (1980-10-01), Humke et al.
patent: 4329419 (1982-05-01), Goff et al.
patent: 4348427 (1982-09-01), Priola et al.
patent: 4414312 (1983-11-01), Goff et al.

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