Compositions and process

Details Compositions and process Compositions and process

1981-08-06

1984-01-10

Lieberman, Allan

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415918, 20415919, 20415923, C08F 248, C08F 250

Patent

active

044252080

ABSTRACT:
The photopolymerization of ethylenically unsaturated compounds is effected using a combination of an aromatic ketone photosensitizer and a tetrasubstituted urea (e.g. N,N,N',N'-tetramethylurea) or N,N-disubstituted acid amide. Storage stable liquid photoinitiator compositions comprising an aromatic ketone sensitizer (e.g. benzophenone) and a tetrasubstituted urea (e.g. N,N,N',N'-tetramethylurea) are also disclosed. The use of the tetrasubstituted urea or N,N-disubstituted amide possesses advantages (storage stability, lack of discoloration on curing) over photosensitizers such as Michler's ketone which have been used previously in combination with aromatic ketone photosensitizers.

REFERENCES:
patent: 3923703 (1975-12-01), Fukutani et al.
patent: 3933885 (1976-01-01), Satomura
patent: 3993549 (1976-11-01), Bush et al.
patent: 4088554 (1978-05-01), Felder et al.
patent: 4110188 (1978-08-01), Darms et al.
patent: 4153525 (1979-05-01), Araki et al.
patent: 4222835 (1980-09-01), Dixon
patent: 4348427 (1982-09-01), Priola et al.

Affiliated with

Also associated with

Rating

Compositions and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Compositions and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions and process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-452562