Compositions and methods of electrochemical removal of...

Details Compositions and methods of electrochemical removal of... Compositions and methods of electrochemical removal of...

2005-06-28

2008-09-09

Ghyka, Alexander G (Department: 2812)

Compositions

Etching or brightening compositions

Inorganic acid containing

C438S693000, C205S674000, C205S684000

Reexamination Certificate

active

07422700

ABSTRACT:
Methods and compositions have been provided for removing barrier layer material from a work piece during an electrochemical mechanical polishing process while protecting a metallization layer of the work piece. The electrochemical planarization composition includes at least one complexing agent capable of complexing with the barrier layer material when exposed to a pH outside of a pH range of greater than about pH 2 and less than about pH 10, a corrosion inhibitor, abrasive particles, and a pH adjuster.

REFERENCES:
patent: 7128825 (2006-10-01), Liu et al.
patent: 2005/0092620 (2005-05-01), Mavliev et al.

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