Compositions and methods for tantalum CMP

Details Compositions and methods for tantalum CMP Compositions and methods for tantalum CMP

2008-01-08

2008-01-08

Shakeri, Hadi (Department: 3723)

Abrading

Abrading process

With tool treating or forming

C451S036000, C051S302000, C438S692000, C252S079400

Reexamination Certificate

active

07316603

ABSTRACT:
A composition suitable for tantalum chemical-mechanical polishing (CMP) comprises an abrasive, an organic oxidizer, and a liquid carrier therefor. The organic oxidizer has a standard redox potential (E0) of not more than about 0.5 V relative to a standard hydrogen electrode. The oxidized form comprises at least one pi-conjugated ring, which includes at least one heteroatom directly attached to the ring. The heteroatom can be a N, O, S or a combination thereof. In a method embodiment, a CMP composition comprising an abrasive, and organic oxidizer having an E0of not more than about 0.7 V relative to a standard hydrogen electrode, and a liquid carrier therefor, is utilized to polish a tantalum-containing surface of a substrate, by abrading the surface of the substrate with the composition, preferably with the aid of a polishing pad.

REFERENCES:
patent: 5044128 (1991-09-01), Nakano
patent: 5489233 (1996-02-01), Cook et al.
patent: 5527423 (1996-06-01), Neville et al.
patent: 5626715 (1997-05-01), Rostoker
patent: 5691219 (1997-11-01), Kawakubo et al.
patent: 5693239 (1997-12-01), Wang et al.
patent: 5709588 (1998-01-01), Muroyama
patent: 5868604 (1999-02-01), Atsugi et al.
patent: 5958288 (1999-09-01), Mueller et al.
patent: 5958794 (1999-09-01), Bruxvoort et al.
patent: 6063306 (2000-05-01), Kaufman et al.
patent: 6093649 (2000-07-01), Roberts et al.
patent: 6126853 (2000-10-01), Kauffman et al.
patent: 6146244 (2000-11-01), Atsugi et al.
patent: 6274063 (2001-08-01), Li et al.
patent: 6290736 (2001-09-01), Evans
patent: 6293848 (2001-09-01), Fang et al.
patent: 6312321 (2001-11-01), Fukishima et al.
patent: 6569215 (2003-05-01), Miyata
patent: 6623355 (2003-09-01), McClain et al.
patent: 6705926 (2004-03-01), Zhou et al.
patent: 6722942 (2004-04-01), Lansford et al.
patent: 2001/0027798 (2001-10-01), Flierl et al.
patent: 2001/0049913 (2001-12-01), Miyata
patent: 2002/0039839 (2002-04-01), Thomas et al.
patent: 2003/0006369 (2003-01-01), Wang et al.
patent: 2003/0181142 (2003-09-01), DeRege Thesauro
patent: 2004/0267018 (2004-12-01), Elliot et al.
patent: 2005/0070211 (2005-03-01), Bian
patent: 2005/0148179 (2005-07-01), Hirai et al.
patent: 2006/0019201 (2006-01-01), Muramatsu et al.
patent: 1-270512 (1989-10-01), None
patent: 11-121411 (1999-04-01), None
patent: WO 00/77107 (2000-12-01), None
patent: WO 01/44396 (2001-06-01), None
patent: WO 2004/044075 (2004-05-01), None
patent: WO 2004/069947 (2004-08-01), None
Fultz, et al. “Mediator Compounds for The Electrochemcial Study of Biological Redox Systems: A Compilation” Analytica Chim. Acta, vol. 140, pp. 1-18 (1982).

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