Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate
2004-11-10
2008-09-02
Webb, Gregory E (Department: 1796)
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
C438S693000, C510S175000, C252S079100
Reexamination Certificate
active
07419911
ABSTRACT:
This invention relates to compositions and methods for removing overfilled substrates, preferably at a relatively high removal rates. Advantageously, a composition according to the invention can contain an oxidizer, preferably a per-type oxidizer such as a peroxide, periodic acid, and peracetic acid, and may also optionally contain an abrasive.
REFERENCES:
patent: 4789674 (1988-12-01), Paioni
patent: 5279771 (1994-01-01), Lee
patent: 5334332 (1994-08-01), Lee
patent: 5399464 (1995-03-01), Lee
patent: 5417877 (1995-05-01), Ward
patent: 5482566 (1996-01-01), Lee
patent: 5489233 (1996-02-01), Cook et al.
patent: 5498565 (1996-03-01), Gocho et al.
patent: 5672577 (1997-09-01), Lee
patent: 5721173 (1998-02-01), Yano et al.
patent: 5891205 (1999-04-01), Picardi et al.
patent: 5902780 (1999-05-01), Lee
patent: 5911835 (1999-06-01), Lee et al.
patent: 5938505 (1999-08-01), Morrison et al.
patent: 5958794 (1999-09-01), Bruxvoort et al.
patent: 5981454 (1999-11-01), Small
patent: 5993686 (1999-11-01), Streinz et al.
patent: 6000411 (1999-12-01), Lee
patent: 6019806 (2000-02-01), Sees et al.
patent: 6063306 (2000-05-01), Kaufman et al.
patent: 6110881 (2000-08-01), Lee et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6121217 (2000-09-01), Lee
patent: 6140287 (2000-10-01), Lee
patent: 6156661 (2000-12-01), Small
patent: 6187730 (2001-02-01), Lee
patent: 6217416 (2001-04-01), Kaufman et al.
patent: 6221818 (2001-04-01), Lee
patent: 6235693 (2001-05-01), Cheng et al.
patent: 6242351 (2001-06-01), Li et al.
patent: 6242400 (2001-06-01), Lee
patent: 6248704 (2001-06-01), Small et al.
patent: 6251150 (2001-06-01), Small et al.
patent: 6276372 (2001-08-01), Lee
patent: 6315803 (2001-11-01), Ina et al.
patent: 6355075 (2002-03-01), Ina et al.
patent: 6367486 (2002-04-01), Lee et al.
patent: 6569349 (2003-05-01), Wang et al.
patent: 6620215 (2003-09-01), Li et al.
patent: 6692546 (2004-02-01), Ma et al.
patent: 6774041 (2004-08-01), Kondo et al.
patent: 6800218 (2004-10-01), Ma et al.
patent: 7029373 (2006-04-01), Ma et al.
patent: 7029508 (2006-04-01), Scott et al.
patent: 2001/0041507 (2001-11-01), Kaufman et al.
patent: 2002/0111024 (2002-08-01), Small et al.
patent: 2002/0173221 (2002-11-01), Li et al.
patent: 2003/0047539 (2003-03-01), Ma et al.
patent: 2003/0073386 (2003-04-01), Ma et al.
patent: 2003/0077985 (2003-04-01), Zhou et al.
patent: 2003/0079416 (2003-05-01), Ma et al.
patent: 2003/0136055 (2003-07-01), Li et al.
patent: 2003/0162398 (2003-08-01), Small et al.
patent: 2003/0164471 (2003-09-01), Small et al.
patent: 2005/0178742 (2005-08-01), Chelle et al.
Chelle Philippe H.
Small Robert J.
EKC Technology, Inc.
Morgan & Lewis & Bockius, LLP
Webb Gregory E
LandOfFree
Compositions and methods for rapidly removing overfilled... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compositions and methods for rapidly removing overfilled..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions and methods for rapidly removing overfilled... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3982866