Compositions and methods for polishing silica, silicates, and si

Abrading – Abrading process – Glass or stone abrading

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51308, 106 3, 451 36, B24B 100

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active

057696896

ABSTRACT:
A composition is provided, which is suitable for polishing SiO.sub.2, silicates, and silicon nitride, comprising an aquesous slurry of submicron SiO.sub.2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.

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patent: 5352277 (1994-10-01), Sasaki
patent: 5637185 (1997-06-01), Murarka et al.
Hayashi et al., "Ammoniom-Salt-Added Silica Slurry for CMP of the Interlayer Dielectric Film Planarization in ULSI's", Jpn. J. Appl. Phys., vol. 34, pp. 1037-1042, 1995.
L. Cook, "Chemical Processes in Glass Polishing," J. Non-Cryst. Solids, 120, pp. 156-165, 1990.

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