Compositions and methods for polishing

Details Compositions and methods for polishing Compositions and methods for polishing

1994-06-27

1995-12-19

Jones, Deborah

Compositions

Etching or brightening compositions

451905, 437228, 51306, 216 89, C09K 1300

Patent

active

054766060

ABSTRACT:
Improved compositions for polishing silicon, silica or silicon-containing articles is provided which consists of an aqueous medium, abrasive particles and an anion which controls the rate of removal of silica. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.

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