Compositions and methods for imparting stain resistance

Stock material or miscellaneous articles – Pile or nap type surface or component – With coating – impregnation – or bond

Reexamination Certificate

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C428S365000, C428S378000, C428S395000, C427S389900, C427S393500, C008S115600, C524S539000, C524S541000, C524S595000, C524S596000, C525S176000, C525S133000, C525S442000

Reexamination Certificate

active

06458443

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to methods and compositions for imparting stain resistance to a substrate. Substrates that may be treated with the methods and compositions of the invention preferably include fibers containing free amino groups, including, but not limited to, polyamide fibers. The processes and compositions of the invention provide the substrate with stain resistance and good photo stability, which prevents yellowing.
BACKGROUND OF THE INVENTION
Materials and substrates containing free amino groups are subject to stain by certain natural and artificial colorants found in foods and other consumer products. The addition of stain resistant characteristics to substrates containing free amino groups provides a more desirable end product for the consumer.
Substrates, including fibers containing free amino groups, such as polyamide fibers, can be made stain resistant to certain stains by contacting the substrate with a solution containing an anionically modified phenol formaldehyde polymer, phenol sulfonates and their derivatives, naphthalene condensates, or blends of these materials. It is also known to blend these materials with polyether polymers, vinyls, polycarbonate polymers, and ethylene polymers.
One method of imparting stain resistance to fibers containing free amino groups is disclosed in U.S. Pat. No. 4,699,812 (Munk et al.). U.S. Pat. No. 4,699,812 discloses a process for imparting stain resistance in which a solution of aliphatic sulfonic acid is applied to the fibers, which are then dried.
U.S. Pat. No. 4,592,940 (Blyth et al.) discloses a process for imparting stain resistance to nylon fibers, in which the fibers are treated with the condensation products of formaldehyde and a mixture of diphenolsulfone and phenolsulfonic acid. The substrate is treated by immersing the carpet in the boiling treatment solution at a pH of 4.5 or less.
U.S. Pat. No. 4,822,373 (Olson et al.) discloses a process for treating polyamide materials in which a fibrous polyamide substrate is treated with a combination of (a) a partially sulfonated phenol formaldehyde polymer and (b) polymethacrylic acid, copolymers of methacrylic acid, or combinations of polymethacrylic acid and copolymers of methacrylic acid. The solution is generally applied as an aqueous solution at a pH below about 7.
U.S. Pat. No. 4,940,757 (Moss, III et al.) discloses a stain resistant polymeric composition for fibers having polyamide linkages. The composition is prepared by polymerizing an &agr;-substituted acrylic acid in the presence of a sulfonated aromatic condensation polymer. The composition is applied to the substrate via flood, spray, foam methods, etc.
Additionally, U.S. Pat. No. 3,949,124 (Jilla) discloses a method and composition of imparting soil-repellency and antistatic properties. The reference discloses the pretreatment of a substrate with a material containing the condensation products of formaldehyde and another component chosen from a wide variety and long list, some of which are sulfonated phenol, diaryl sulfone, urea, melamine and dicayndiamide, followed by heat treatment and application of a separate composition containing, as one ingredient, a water-dispersible polyester and amino polymer followed by another heat treatment. U.S. Pat. No. 3,949,124 concerns imparting antistatic and antisoiling properties, which are distinct from stain resistance.
Those skilled in the art recognize that while anionically modified phenol formaldehyde polymers, napthalene condensates, lignin sulfonates and phenol sulfonate derivatives provide stainblocking, their photo instability causes yellowing of the dyed substrate over time. Therefore, there exists a need for compositions and methods that provide excellent stain resistance, while at the same time exhibiting reduced photo instability, i.e. reduced yellowing.
SUMMARY OF THE INVENTION
The present invention solves these problems, and provides further surprising properties. These and further objects of the invention will be more readily appreciated when considering the following disclosure and appended claims.
The present invention concerns a composition for imparting stain resistance to a substrate comprising (a) a component selected from the group consisting of (1) an anionically modified phenol formaldehyde polymer comprising a phenol moiety and a formaldehyde moiety, (2) a naphthalene condensate, (3) a lignin sulfonate, (4) a phenol sulfonate derivative, a mixture thereof, and (5) a (meth)acrylic polymer comprising residues of acrylic or methacrylic acid; and (b) a polyester.
The invention further concerns a method of treating a substrate for stain resistance comprising applying to the substrate an aqueous solution or dispersion comprising (a) a component selected from the group consisting of (1) an anionically modified phenol formaldehyde polymer comprising a phenol moiety and a formaldehyde moiety, (2) a naphthalene condensate, (3) a lignin sulfonate, (4) a phenol sulfonate derivative, a mixture thereof, and (5) a (meth)acrylic polymer comprising residues of acrylic or methacrylic acid; (b) a polyester; and (c) water.
The invention further concerns a method of treating a substrate for stain resistance comprising treating the substrate with a stain resist composition comprising (a) a component selected from the group consisting of (1) an anionically modified phenol formaldehyde polymer comprising a phenol moiety and a formaldehyde moiety, (2) a naphthalene condensate, (3) a lignin sulfonate, (4) a phenol sulfonate derivative, a mixture thereof, and (5) a (meth)acrylic polymer comprising residues of acrylic of methacrylic acid; and (b) a polyester.
The invention also includes articles treated with the composition, and articles made using treated substrates. In a preferred embodiment, the articles include, but are not limited to, fibers having polyamide groups.
DETAILED DESCRIPTION OF THE INVENTION
The present invention may be understood more readily by reference to the following detailed description of preferred embodiments of the invention and the Examples included therein.
Before the present compositions of matter and methods are disclosed and described, it is to be understood that this invention is not limited to specific synthetic methods or to particular formulations, as such may, of course, vary. It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting.
In this specification and in the claims which follow, reference will be made to a number of terms which shall be defined to have the following meanings:
The singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise.
“Optional” or “optionally” means that the subsequently described event or circumstances may or may not occur, and that the description included instances where said event or circumstance occurs and instances where it does not.
“Total weight”, when used in reference to the stain resist composition, means the weight of the stain resist composition including components (a), (b) and any other components present in the stain resist composition.
Throughout this application, where publications are referenced, the disclosures of these publications in their entireties are hereby incorporated by reference into this application in order to more fully describe the state of the art to which this invention pertains.
The present invention concerns a composition for imparting stain resistance to a substrate comprising (a) a component selected from the group consisting of (1) an anionically modified phenol formaldehyde polymer comprising a phenol moiety and a formaldehyde moiety, (2) a naphthalene condensate, (3) a lignin sulfonate, (4) a phenol sulfonate derivative, a mixture thereof, and (5) a (meth)acrylic polymer comprising residues of acrylic or methacrylic acid; and (b) a polyester.
The invention further concerns a method of treating a substrate for stain resistance comprising applying to the substrate an aqueous solution or dis

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