Cleaning and liquid contact with solids – Processes – With treating fluid motion
Reexamination Certificate
2006-03-14
2006-03-14
Anthony, Joseph D. (Department: 1714)
Cleaning and liquid contact with solids
Processes
With treating fluid motion
C134S036000, C134S002000, C134S022190, C252S194000, C252S184000, C252S364000, C510S175000, C510S407000
Reexamination Certificate
active
07011716
ABSTRACT:
Drying of patterned wafers is achieved in a manner effecting removal of water from the patterned wafers without collapse or deterioration of the pattern structures thereof. The drying is carried out in one aspect of the invention with a composition containing supercritical fluid, and at least one water-reactive agent that chemically reacts with water to form reaction product(s) more soluble in the supercritical fluid than water. Various methodologies are described for use of supercritical fluids to dry patterned wafers, which avoid the (low water solubility) deficiency of supercritical fluids such as supercritical CO2.
REFERENCES:
patent: 5730874 (1998-03-01), Wai et al.
patent: 5868856 (1999-02-01), Douglas et al.
patent: 5868862 (1999-02-01), Douglas et al.
patent: 5965025 (1999-10-01), Wai et al.
patent: 6187911 (2001-02-01), Wai et al.
patent: 6398875 (2002-06-01), Cotte et al.
patent: 6558475 (2003-05-01), Jur et al.
patent: 6562146 (2003-05-01), DeYoung et al.
patent: 6576066 (2003-06-01), Namatsu
patent: 6596093 (2003-07-01), DeYoung et al.
patent: 6602349 (2003-08-01), Chandra et al.
patent: 6602351 (2003-08-01), DeYoung et al.
patent: 6684525 (2004-02-01), DeSimone et al.
patent: 6764552 (2004-07-01), Joyce et al.
patent: 6770426 (2004-08-01), Vaartstra
patent: 6804900 (2004-10-01), Kawakami et al.
patent: 6858089 (2005-02-01), Castrucci
patent: 2003/0047195 (2003-03-01), DeYoung et al.
patent: 2003/0125225 (2003-07-01), Xu et al.
patent: 2004/0038532 (2004-02-01), Kawakami et al.
patent: 2004/0072706 (2004-04-01), Arena-Foster et al.
patent: 2004/0175948 (2004-09-01), DeSimone et al.
Baum Thomas H.
Borovik Alexander
Ghenciu Eliodor G.
Korzenski Michael
Xu Chongying
Advanced Technology & Materials Inc.
Anthony Joseph D.
Chappuis Maggie
Fuierer Tristan A.
Hultquist Steven J.
LandOfFree
Compositions and methods for drying patterned wafers during... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compositions and methods for drying patterned wafers during..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions and methods for drying patterned wafers during... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3540741