Composition useful in making extensible films

Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal

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260 775CR, C08L 7504

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active

040340171

ABSTRACT:
Cured coatings having a high degree of extensibility, gloss retention, good sprayability and other desirable properties are obtained from compositions made by reacting (A) an organic polyisocyanate; (B) a hydroxy-containing material selected from the group consisting of saturated polymeric diols having low glass transition temperatures, saturated low molecular weight diols, and mixtures thereof; (C) a hydroxyalkyl ester of an ethylenically unsaturated carboxylic acid; (D) one or more copolymerizable monomers; and (E) a curing agent. These compositions, when used as coatings, are durable, adherent and highly flexible. The coatings are particularly useful on resilient and rubbery substrates such as EPDM rubber, foam rubber, polyurethane foam, and on metal surfaces, such as mild steel and aluminum.

REFERENCES:
patent: 3297745 (1967-01-01), Fekete
patent: 3368988 (1968-02-01), Sekmakas
patent: 3457324 (1969-07-01), Sekmakas
patent: 3624020 (1971-11-01), Klebert
patent: 3641199 (1972-02-01), Niederhauser
patent: 3677920 (1972-07-01), Kai
patent: 3772404 (1973-11-01), Knight
patent: 3779995 (1973-12-01), Dannels
patent: 3891523 (1975-06-01), Hisamatsu
patent: 3919351 (1975-11-01), Chang

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