Composition useful for stripping photoresist polymers and method

Details Composition useful for stripping photoresist polymers and method Composition useful for stripping photoresist polymers and method

1984-11-05

1986-06-03

Golian, Joseph

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

252153, 252158, 252171, B08B 700, C09D 904

Patent

active

045927871

ABSTRACT:
This invention is a composition suitable for stripping cross-linked photoresist polymer which comprises

REFERENCES:
patent: 3574123 (1971-04-01), Laugle
patent: 3796602 (1974-03-01), Briney et al.
patent: 3839234 (1974-10-01), Roscoe
patent: 4202703 (1980-05-01), Zuber et al.

Affiliated with

Also associated with

Rating

Composition useful for stripping photoresist polymers and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composition useful for stripping photoresist polymers and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition useful for stripping photoresist polymers and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1231271