Composition for the removing of sidewall residues

Details Composition for the removing of sidewall residues Composition for the removing of sidewall residues

2003-05-27

2008-08-26

Brunsman, David M (Department: 1793)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S375000, C134S001300, C134S003000, C438S800000, C438S963000, C216S104000, C216S109000

Reexamination Certificate

active

07417016

ABSTRACT:
The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular from aluminium or aluminium-containing surfaces, during the production of semiconductor elements.

REFERENCES:
patent: 5294570 (1994-03-01), Fleming, Jr. et al.
patent: 5486266 (1996-01-01), Tsai et al.
patent: 6043206 (2000-03-01), Song et al.
patent: 6273959 (2001-08-01), Oonishi et al.
patent: 6383723 (2002-05-01), Iyer et al.
patent: 6605230 (2003-08-01), Liaw et al.
patent: 6656852 (2003-12-01), Rotondaro et al.
patent: 6773959 (2004-08-01), Yau
patent: 6953533 (2005-10-01), Kool et al.
patent: 0477504 (1992-04-01), None
patent: 0811666 (1997-12-01), None
patent: 10-125462 (1998-05-01), None
patent: 2001-144044 (2001-05-01), None
patent: WO 9736209 (1997-10-01), None

Affiliated with

Also associated with

Rating

Composition for the removing of sidewall residues does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composition for the removing of sidewall residues, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for the removing of sidewall residues will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3993910