Composition for removing photoresist layer and method for...

Details Composition for removing photoresist layer and method for... Composition for removing photoresist layer and method for...

2006-05-12

2011-10-18

Wood, Elizabeth (Department: 1732)

Abrasive tool making process, material, or composition

Miscellaneous

C051S298000, C051S307000

Reexamination Certificate

active

08038749

ABSTRACT:
A composition for removing a photoresist layer and a method for using it are disclosed. The composition comprises a chemical portion which includes water and chemical constituents dissolving or softening the photoresist layer and a mechanical portion which is abrasive particles. Using the composition and the method according to the present invention can decrease the conventional two steps of removing a photoresist layer process to one step, thereby simplifying the procedure, shortening the removing time and reducing the cost. The chemical constituents in the composition according to the present invention are of low toxicity and flammability and the amount used is small, which makes it more friendly with the environment and decreases the expense of disposing the waste.

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International Search Report dated Aug. 24, 2006.

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