Composition for polishing a composite of silica and silicon nitr

Details Composition for polishing a composite of silica and silicon nitr Composition for polishing a composite of silica and silicon nitr

1998-03-10

2000-03-28

Utech, Benjamin L.

Compositions

Etching or brightening compositions

252 794, C09K 1300, C09K 1306

Patent

active

060427418

ABSTRACT:
A composition is provided for polishing a composite comprised of silica and silicon nitride comprising: an aqueous medium, abrasive particles, a surfactant, and a compound which complexes with the silica and silicon nitride wherein the complexing agent has two or more functional groups each having a dissociable proton, the functional groups being the same or different.

REFERENCES:
patent: 4448634 (1984-05-01), Lampert
patent: 4526631 (1985-07-01), Silvestri et al.
patent: 4671851 (1987-06-01), Beyer et al.
patent: 5264010 (1993-11-01), Brancaleoni et al.
patent: 5391258 (1995-02-01), Brancaleoni et al.
patent: 5445996 (1995-08-01), Kodera et al.
patent: 5476606 (1995-12-01), Brancaleoni et al.
patent: 5502007 (1996-03-01), Murase
patent: 5693239 (1997-12-01), Wang et al.
patent: 5709588 (1998-01-01), Muroyama
patent: 5738800 (1998-04-01), Hosali et al.
patent: 5759917 (1998-06-01), Grover
patent: 5770103 (1998-06-01), Wang et al.

Affiliated with

Also associated with

Rating

Composition for polishing a composite of silica and silicon nitr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composition for polishing a composite of silica and silicon nitr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for polishing a composite of silica and silicon nitr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1323140