Compositions – Fluent dielectric – N-containing
Patent
1989-04-27
1991-04-23
Willis, Prince E.
Compositions
Fluent dielectric
N-containing
252546, 252547, 252DIG13, 252DIG2, 252DIG5, 812751, 424 70, 424 78, C11D 102
Patent
active
050098136
ABSTRACT:
A composition for a hair treatment agent comprising as essential components: a chelating agent having a specific chelating value with respect to the chelation of the calcium ion, and a polymer compound selected from a group consisting of cationic polymers containing quaternary nitrogen, and peptides of an average molecular weight of 40 to 10,000, or their derivatives. The composition provides a perm-treatment with a good finishing effect by depressing absorption of calcium to the hair when it is perm-treated. It also serves as a shampoo, by further formulating an anionic or amphoteric surface active agent, which gives an excellent effect of suppleness and smoothness after washing and rinsing to hair which is damaged from a perm treatment.
REFERENCES:
patent: 4009256 (1977-02-01), Nowak, Jr. et al.
patent: 4180084 (1979-12-01), Wegmuller et al.
patent: 4220548 (1980-09-01), Mashimoto et al.
patent: 4272517 (1981-06-01), Yoneda et al.
patent: 4273760 (1981-06-01), Koehler et al.
patent: 4329334 (1982-05-01), Su et al.
patent: 4362528 (1982-12-01), Grollier et al.
patent: 4364837 (1982-12-01), Pader
patent: 4391286 (1983-07-01), Hsiung et al.
patent: 4445521 (1984-05-01), Grollier et al.
patent: 4477375 (1984-10-01), Grollier
patent: 4578216 (1986-03-01), Fujii et al.
Hirota Hajime
Koshika Tomohito
Moriya Naoko
Nozaki Toshio
Ogino Hidekazu
Kao Corporation
Silbermann James M.
Willis Prince E.
LandOfFree
Composition for hair treatment agent does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for hair treatment agent, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for hair treatment agent will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1619895