Composition for forming porous film, porous film and method...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Cellular products or processes of preparing a cellular...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C521S110000, C521S154000, C257S040000

Reexamination Certificate

active

10703374

ABSTRACT:
The present invention provides a composition for film formation which can form a porous film that excels in dielectric properties, adhesion, film consistency and mechanical strength, and that is easily thinned; a porous film and a method for forming the same, and a high-performing and highly reliable semiconductor device which contains the porous film inside. More specifically, the composition for forming a porous film comprises a solution containing an amorphous polymer which is obtained by hydrolyzing and condensing at least one silane compound expressed by the general formula (R1)nSi(OR2)4−n, and a zeolite sol which is formed by using a quaternary ammonium hydroxide. The method for forming a porous film comprises a coating step for coating the composition for forming a porous film; a subsequent drying step; and a porousness forming step.

REFERENCES:
patent: 4503024 (1985-03-01), Bourgogne et al.
patent: 6084096 (2000-07-01), Li et al.
patent: 6248682 (2001-06-01), Thompson et al.
patent: 6440309 (2002-08-01), Cohen
patent: 6685889 (2004-02-01), Raftery et al.
patent: 6794544 (2004-09-01), Babiak et al.
patent: 2003/0151032 (2003-08-01), Ito et al.
patent: 9194298 (1997-07-01), None
patent: 2000044875 (2000-02-01), None
patent: 2000-143429 (2000-05-01), None
patent: 2001115029 (2001-04-01), None
patent: 2001130911 (2001-05-01), None
patent: 2001203197 (2001-07-01), None
patent: WO 92/20623 (1992-11-01), None
patent: WO 02/0617765 (2002-08-01), None
Burkett, et al. “Mechanism of Structure Direction in the Synthesis of Si-ZSM-5: An Investigation by Intermolecular1H-29Si CP MAS NMR”J. Phys. Chem.98:4647-4653 (1994).
Burkett, et al. “Mechanism of Structure Direction in the Synthesis of Pure-Silica Zeolites. 1. Synthesis of TPA/Si-ZSM-5”Chem. Mater.7:920-928 (1995).
Burkett, et al. “Mechanism of Structure Direction in the Synthesis of Pure-Silica Zeolites. 2. Hydrophobic Hydration and Structural Specificity”Chem. Mater.7:1453-1463 (1995).
Davis, et al. “Towards the Rational Design and Synthesis of Microporous and Mesoporous Silica-Containing Materials”Zeolite12(2):33-47 (1995).
Huang, et al. “Fabrication of Ordered Porous Structures by Self-Assembly of Zeolite Nanocrystals”J. Am. Chem. Soc.122:3530-3531 (2000).
Inagaki, et al. “Synthesis of Highly Ordered Mesoporous Materials from a Layered Polysilicate”J. Chem. Soc., Chem. Commun.p. 680-682 (1993).
Ono, et al.Zeolite no Kagaku to Kougaku(The Science and Technology of Zeolite) Published By: Koudansha Scientific, Co., Ltd. (Jul. 10, 2000) English translation of pp. 30-35.
Wang et al. “Colloidal Suspensions of Template-Removed Zeolite Nanocrystals”Chem. Commun.2333-2334 (2000).
Wang, et al. “Pure-Silica Zeolite Low-kDielectric Thin Films”Advanced Materials13(10):746-749 (May 17, 2001).
Xu, et al. “A Novel Method for the Preparation of Zeolite ZSM-5”J. Chem. Soc., Chem. Commun.755-756 (1990).
Lobo et al. (1995) “Structure-Direction in Zeolite Synthesis”Journal of Inclusion Phenomena and Molecular Recognition in Chemistry21:47-78.
Lovallo et al. (1996) “Preferentially Oriented Submicron Silicate Membranes”AlChE Journal42:2333-2334.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Composition for forming porous film, porous film and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composition for forming porous film, porous film and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for forming porous film, porous film and method... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3836254

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.