Composition for forming porous film, porous film and method...

Details Composition for forming porous film, porous film and method... Composition for forming porous film, porous film and method...

2007-04-17

2007-04-17

Zemel, Irina S. (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Cellular products or processes of preparing a cellular...

C521S099000, C521S112000, C521S154000, C528S021000, C528S034000, C525S342000, C525S446000

Reexamination Certificate

active

10796170

ABSTRACT:
Provided is a coating liquid for forming a porous film having desirably controlled thickness and having excellent dielectric and mechanical properties, using the conventional semiconductor process. Specifically, provided is a composition for forming a porous film comprising a condensation product and an organic solvent wherein the condensation product is obtained by hydrolysis and condensation, at presence of a basic catalyst, ofone or more silane compounds represented by formula (1): R1kSi(OR2)4-k,and one or more crosslinking agents represented by formula (2): {Xj(Y)3-jSi-(L)m-}nMZ4-n.Moreover, a method for manufacturing a porous film comprising steps of applying said composition so as to form a film, drying the film and heating the dried film so as to hardent the film, and others are provided.

REFERENCES:
patent: 4634509 (1987-01-01), Shimizu et al.
patent: 5494859 (1996-02-01), Kapoor
patent: 5707783 (1998-01-01), Stauffer et al.
patent: 6020446 (2000-02-01), Okamoto et al.
patent: 6037275 (2000-03-01), Wu et al.
patent: 6197913 (2001-03-01), Zhong
patent: 6313045 (2001-11-01), Zhong et al.
patent: 6359096 (2002-03-01), Zhong et al.
patent: 6376634 (2002-04-01), Nishikawa et al.
patent: 6391999 (2002-05-01), Crivello
patent: 6413647 (2002-07-01), Hayashi et al.
patent: 6495264 (2002-12-01), Hayashi et al.
patent: 6512071 (2003-01-01), Hacker et al.
patent: 6533855 (2003-03-01), Gaynor et al.
patent: 6534025 (2003-03-01), Yano et al.
patent: 6596404 (2003-07-01), Albaugh et al.
patent: 6632489 (2003-10-01), Watanabe et al.
patent: 6639015 (2003-10-01), Nakashima et al.
patent: 6696538 (2004-02-01), Ko et al.
patent: 2002/0020327 (2002-02-01), Hayashi et al.
patent: 2002/0098279 (2002-07-01), Lyu et al.
patent: 2002/0155053 (2002-10-01), Nishiyama et al.
patent: 2002/0160207 (2002-10-01), Kohmura et al.
patent: 2003/0064321 (2003-04-01), Malik et al.
patent: 2003/0091838 (2003-05-01), Hayashi et al.
patent: 2003/0104225 (2003-06-01), Shiota et al.
patent: 2003/0157311 (2003-08-01), MacDougall et al.
patent: 1 205 438 (2002-05-01), None
patent: 1223192 (2002-07-01), None
patent: 1245642 (2002-10-01), None
patent: 1 123 753 (2003-08-01), None
patent: 63-015355 (1988-04-01), None
patent: 05-125191 (1993-05-01), None
patent: 06-145599 (1994-05-01), None
patent: 9-194298 (1997-07-01), None
patent: 11-246665 (1999-09-01), None
patent: 2000-44875 (2000-02-01), None
patent: 2000-309751 (2000-11-01), None
patent: 2000-309753 (2000-11-01), None
patent: 2000-345041 (2000-12-01), None
patent: 2001-002993 (2001-01-01), None
patent: 2001-049178 (2001-02-01), None
patent: 2001-049179 (2001-02-01), None
patent: 2001-055554 (2001-02-01), None
patent: 2001-080915 (2001-03-01), None
patent: 2001-98218 (2001-04-01), None
patent: 2001-115021 (2001-04-01), None
patent: 2001-115028 (2001-04-01), None
patent: 2001-115029 (2001-04-01), None
patent: 2001-130911 (2001-05-01), None
patent: 2001-131479 (2001-05-01), None
patent: 2001-157815 (2001-06-01), None
patent: 2001-164186 (2001-06-01), None
patent: 2001-203197 (2001-07-01), None
patent: 2001-240798 (2001-09-01), None
patent: 2002-20688 (2002-01-01), None
patent: 2002-020689 (2002-01-01), None
patent: 2002-023354 (2002-01-01), None
patent: 2002-030249 (2002-01-01), None
patent: 2002-038090 (2002-02-01), None
patent: WO 00/12640 (2000-03-01), None
patent: WO 03/088344 (2003-10-01), None
Burkett et al., “Synthesis Of Hybrid Inorganic-Organic Mesoporous Silica By Co-Condensation Of Siloxane And Organosiloxane Precursors,”J. Chem. Soc. Chem. Commun., 1996, 1367-1368.
Inagaki et al., “Synthesis Of Highly Ordered Mesoporous Materials From A Layered Polysilicate”,J. Chem. Soc. Chem. Commun., 1993, pp. 680-682.

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