Composition for forming porous film, porous film and method...

Details Composition for forming porous film, porous film and method... Composition for forming porous film, porous film and method...

2006-11-07

2006-11-07

Zemel, Irina S. (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

C524S064000, C524S186000, C521S094000, C521S184000

Reexamination Certificate

active

07132473

ABSTRACT:
Provided are a composition for forming film which can form porous film excelling in dielectric constant, adhesiveness, uniformity of the film, mechanical strength and having low hygroscopicity; porous film and a method for forming the film; and a high-performing and highly reliable semiconductor device comprising the porous film inside. More specifically, provided is a composition for forming porous film, the composition comprising siloxane polymer and one or more quaternary ammonium salts represented by following formula (1) or (2):in-line-formulae description="In-line Formulae" end="lead"?[(R1)4N]+[R2X]−  (1)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?Hk[(R1)4N]m+YV−  (2)in-line-formulae description="In-line Formulae" end="tail"?wherein X represents CO2, OSO3or SO3; Y represents SO4, SO3, CO3, O2C—CO2, NO3or NO2; and k is 0 or 1, m is 1 or 2 and n is 1 or 2 in proviso that n=1 requires k=0 and m=1, and n=2 requires k=0 and m=2, or k=1 and m=1.

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