Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Reexamination Certificate
2002-10-04
2008-09-16
Feely, Michael J (Department: 1796)
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
C427S098200, C427S098400, C525S103000, C525S523000, C525S529000, C428S413000, C428S500000
Reexamination Certificate
active
07425347
ABSTRACT:
The present invention relates to a composition for forming anti-reflective coating for use in a lithography process in manufacture of a semiconductor device which comprises polymer (A) having a weight average molecular weight of 5,000 or less, and a polymer (B) having a weight average molecular weight of 20,000 or more. The composition provides an anti-reflective coating for use in a lithography which is excellent in step coverage on a substrate with an irregular surface, such as hole or trench, has a high anti-reflection effect, causes no intermixing with a resist layer, provides an excellent resist pattern, and has a higher dry etching rate compared with the resist layer.
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Taylor et al., “Methacrylate Resists and Antireflective Coatings for 193 nm Lithography,” Part of the SPIE Conference on Advances in Resist Technology and Processing XVI Santa Clara, California, SPIE, vol. 3678 pp. 174-185, Mar. 1999.
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Mizusawa Ken-ichi
Takei Satoshi
Yasumi Yoshiaki
Feely Michael J
Nissan Chemical Industries Ltd
Oliff & Berridg,e PLC
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