Composition for forming a transparent conducting film,...

Compositions – Electrically conductive or emissive compositions – Metal compound containing

Reexamination Certificate

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C427S058000, C427S372200, C427S377000, C427S601000

Reexamination Certificate

active

07147805

ABSTRACT:
The composition of the present invention is one for forming a transparent conducting film, the composition comprising a water-soluble indium compound, a halogen-containing water-soluble organotin compound and a water-soluble organic high molecular compound. A method for forming a transparent conducting film according to the invention comprises the steps of i) applying to a substrate a solution for forming a transparent conducting film containing the composition in water or a solvent comprising water and an organic solvent, and ii) firing the coating film. This method may further include iii) the step of subjecting the film obtained in the firing step ii) to a reducing heat treatment.

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Furusaki et al., “Preparation of ITO Thin Films by Sol-Gel Method,” Journal of the Ceramic Society of Japan, 102(2), pp. 200-205, (1994).
Chinese Office Action of Corresponding Chinese Application No. 03148967.2 dated Apr. 28, 2006.
Furusaki, et al., “Preparation of ITO Thin Films by Sol-Gel Method,” Journal of the Ceramic Society of Japan 102[2] p. 200-205 (1994).

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