Stock material or miscellaneous articles – Composite – Of silicon containing
Reexamination Certificate
2006-10-31
2006-10-31
Peng, Kuo-Liang (Department: 1712)
Stock material or miscellaneous articles
Composite
Of silicon containing
C426S387000, C528S021000, C524S588000
Reexamination Certificate
active
07128976
ABSTRACT:
A composition for film formation which comprises:(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and an ammonium compound, and(B) an organic solvent.
REFERENCES:
patent: 4214057 (1980-07-01), Ishihara et al.
patent: 4555545 (1985-11-01), Kimura et al.
patent: 4624870 (1986-11-01), Anthony
patent: 5013800 (1991-05-01), Inoue
patent: 5091460 (1992-02-01), Seto et al.
patent: 5225510 (1993-07-01), Bank et al.
patent: 5605997 (1997-02-01), Yamamoto et al.
patent: 5662961 (1997-09-01), Tanitsu et al.
patent: 6410150 (2002-06-01), Kurosawa et al.
patent: 6410151 (2002-06-01), Kurosawa et al.
patent: 6413647 (2002-07-01), Hayashi et al.
patent: 6472079 (2002-10-01), Hayashi et al.
patent: 6495264 (2002-12-01), Hayashi et al.
patent: 6558747 (2003-05-01), Nakata et al.
patent: 0 226 208 (1987-06-01), None
patent: 11-340219 (1999-12-01), None
patent: 11-340220 (1999-12-01), None
U.S. Appl. No. 10/270,066, filed Oct. 15, 2002, Shiota et al.
U.S. Appl. No. 10/103,996, filed Mar. 25, 2002, Hayashi et al.
U.S. Appl. No. 10/165,324, filed Jun. 10, 2002, Hayashi et al.
U.S. Appl. No. 10/269,967, filed Oct. 15, 2002, Hayashi et al.
Hasegawa Kouichi
Hayashi Eiji
Nishikawa Michinori
Seo Youngsoo
Yamada Kinji
JSR Corporation
Peng Kuo-Liang
LandOfFree
Composition for film formation, method of film formation,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for film formation, method of film formation,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for film formation, method of film formation,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3678537