Composition for film formation, method of film formation,...

Stock material or miscellaneous articles – Composite – Of silicon containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C426S387000, C528S021000, C524S588000

Reexamination Certificate

active

07128976

ABSTRACT:
A composition for film formation which comprises:(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and an ammonium compound, and(B) an organic solvent.

REFERENCES:
patent: 4214057 (1980-07-01), Ishihara et al.
patent: 4555545 (1985-11-01), Kimura et al.
patent: 4624870 (1986-11-01), Anthony
patent: 5013800 (1991-05-01), Inoue
patent: 5091460 (1992-02-01), Seto et al.
patent: 5225510 (1993-07-01), Bank et al.
patent: 5605997 (1997-02-01), Yamamoto et al.
patent: 5662961 (1997-09-01), Tanitsu et al.
patent: 6410150 (2002-06-01), Kurosawa et al.
patent: 6410151 (2002-06-01), Kurosawa et al.
patent: 6413647 (2002-07-01), Hayashi et al.
patent: 6472079 (2002-10-01), Hayashi et al.
patent: 6495264 (2002-12-01), Hayashi et al.
patent: 6558747 (2003-05-01), Nakata et al.
patent: 0 226 208 (1987-06-01), None
patent: 11-340219 (1999-12-01), None
patent: 11-340220 (1999-12-01), None
U.S. Appl. No. 10/270,066, filed Oct. 15, 2002, Shiota et al.
U.S. Appl. No. 10/103,996, filed Mar. 25, 2002, Hayashi et al.
U.S. Appl. No. 10/165,324, filed Jun. 10, 2002, Hayashi et al.
U.S. Appl. No. 10/269,967, filed Oct. 15, 2002, Hayashi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Composition for film formation, method of film formation,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composition for film formation, method of film formation,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for film formation, method of film formation,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3678537

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.