Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Reexamination Certificate
2008-06-18
2010-06-29
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
C430S313000, C430S330000, C430S331000
Reexamination Certificate
active
07745077
ABSTRACT:
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1),where, R1to R5are independently selected from hydrogen and C1to C6alkyl, and W is C1to C6alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.
REFERENCES:
patent: 3104205 (1963-09-01), Hainer et al.
patent: 3666473 (1972-05-01), Colom et al.
patent: 4521404 (1985-06-01), Lorenz et al.
patent: 4595737 (1986-06-01), Straub et al.
patent: 4812551 (1989-03-01), Oi et al.
patent: 4823345 (1989-04-01), Daniel et al.
patent: 5035881 (1991-07-01), Mori et al.
patent: 5073233 (1991-12-01), Banks et al.
patent: 5294444 (1994-03-01), Nakamura et al.
patent: 5538820 (1996-07-01), Fisher
patent: 5547812 (1996-08-01), Collins et al.
patent: 5585219 (1996-12-01), Kaimoto et al.
patent: 5626836 (1997-05-01), Liu et al.
patent: 5750680 (1998-05-01), Kim et al.
patent: 5803707 (1998-09-01), Schips et al.
patent: 5820491 (1998-10-01), Hatch et al.
patent: 5830964 (1998-11-01), Liu et al.
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5858620 (1999-01-01), Ishibashi et al.
patent: 5863707 (1999-01-01), Lin
patent: 5955606 (1999-09-01), Kim et al.
patent: 6051678 (2000-04-01), Kim et al.
patent: 6080707 (2000-06-01), Glenn et al.
patent: 6090772 (2000-07-01), Kaiser et al.
patent: 6136499 (2000-10-01), Goodall et al.
patent: 6262222 (2001-07-01), Kim et al.
patent: 6274286 (2001-08-01), Hatakeyama et al.
patent: 6319853 (2001-11-01), Ishibashi et al.
patent: 6365322 (2002-04-01), Padmanaban et al.
patent: 6376157 (2002-04-01), Tanaka et al.
patent: 6447980 (2002-09-01), Rahman et al.
patent: 6555607 (2003-04-01), Kanda et al.
patent: 6579657 (2003-06-01), Ishibashi et al.
patent: 6727034 (2004-04-01), Ogiso et al.
patent: 6811817 (2004-11-01), Sugeta et al.
patent: 6818258 (2004-11-01), Kaneko et al.
patent: 6864035 (2005-03-01), Imai
patent: 6916590 (2005-07-01), Kaneko et al.
patent: 7141177 (2006-11-01), Tanaka
patent: 7189449 (2007-03-01), Osanai et al.
patent: 7189499 (2007-03-01), Sugeta et al.
patent: 7226726 (2007-06-01), Kanda
patent: 7252783 (2007-08-01), Weir et al.
patent: 7314691 (2008-01-01), Hata et al.
patent: 7335464 (2008-02-01), Takano et al.
patent: 7399582 (2008-07-01), Takahashi et al.
patent: 2001/0044070 (2001-11-01), Uetani et al.
patent: 2002/0192591 (2002-12-01), Komatsu et al.
patent: 2003/0008968 (2003-01-01), Sugeta et al.
patent: 2003/0091732 (2003-05-01), Kanda
patent: 2003/0102285 (2003-06-01), Nozaki et al.
patent: 2003/0129538 (2003-07-01), Sheu et al.
patent: 2003/0143490 (2003-07-01), Kozawa et al.
patent: 2004/0109958 (2004-06-01), Nigam et al.
patent: 2004/0110099 (2004-06-01), Kozawa et al.
patent: 2004/0121259 (2004-06-01), Kozawa et al.
patent: 2005/0123851 (2005-06-01), Shinbori et al.
patent: 2005/0175926 (2005-08-01), Sugeta et al.
patent: 2005/0227151 (2005-10-01), Hata et al.
patent: 2005/0245663 (2005-11-01), Sugeta et al.
patent: 2006/0073419 (2006-04-01), Kozawa et al.
patent: 2006/0088788 (2006-04-01), Kudo et al.
patent: 2006/0099347 (2006-05-01), Sugeta et al.
patent: 2006/0160015 (2006-07-01), Takano et al.
patent: 2006/0183218 (2006-08-01), Takahashi et al.
patent: 2006/0211814 (2006-09-01), Nishikawa et al.
patent: 2006/0258809 (2006-11-01), Sugeta et al.
patent: 2007/0059644 (2007-03-01), Takahashi et al.
patent: 2007/0213447 (2007-09-01), Sugeta et al.
patent: 2007/0259106 (2007-11-01), Shimizu et al.
patent: 2008/0044759 (2008-02-01), Ishibashi et al.
patent: 2008/0193880 (2008-08-01), Nishibe et al.
patent: 2008/0248427 (2008-10-01), Thiyagarajan et al.
patent: 1 223 470 (2002-07-01), None
patent: 1 602 983 (2005-07-01), None
patent: 1 757 989 (2007-02-01), None
patent: 2 305 175 (1997-04-01), None
patent: 2 320 500 (1998-06-01), None
patent: 36-22145 (1961-11-01), None
patent: 1-221750 (1989-09-01), None
patent: 3-200805 (1991-09-01), None
patent: 5-241348 (1993-09-01), None
patent: 6-81173 (1994-03-01), None
patent: 6-250379 (1994-09-01), None
patent: 7-191214 (1995-07-01), None
patent: 9-235318 (1997-09-01), None
patent: 9-244262 (1997-09-01), None
patent: 9-325502 (1997-12-01), None
patent: 10-73927 (1998-03-01), None
patent: 5-166717 (2009-11-01), None
patent: WO 98/14832 (1998-04-01), None
patent: WO 00/17712 (2000-03-01), None
patent: WO 00/67072 (2000-11-01), None
patent: WO 02/48260 (2002-06-01), None
patent: WO 2006/019135 (2006-02-01), None
patent: WO 2007/013230 (2007-02-01), None
patent: WO 2009/091361 (2009-07-01), None
English Language Abstract of JP 1-221750 A.
English Language Abstract of JP 3-200805 A.
English Language Abstract of JP 5-241348 A.
English Language Abstract of JP 6-250379 A.
English Language Abstract of JP 6-81173 A.
English Language Abstract of JP 9-235318 A.
English Language Abstract of JP 9-244262 A.
English Language Abstract of JP 9-325502 A.
English Language Translation of Claim for JP 36-22145.
Complete set of specification papers for U.S. Appl. No. 10/089,704, filed Oct. 4, 2000 with cover page.
Office Action dated Dec. 30, 2008 for U.S. Appl. No. 11/697,804.
International Search Report (Form PCT/ISA/210) for PCT/JP00/06940.
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration (Form PCT/ISA/220); International Report (Form PCT/ISA/210); and Written Opinion of the International Searching Authority (Form PCT/ISA/237) for PCT/IB2006/003347.
Substantive/Modified Substantive Examination and Search Report (in English) for Malaysian patent application No. PI 20013263.
English Translation (and original language document) of Pre-Notification of Reasons for Possible Rejection of the Pending Patent Examination dated Mar. 19, 2004; of Decision on Examination dated May 20, 2004; and of Pre-Notification of Reasons for Possible Rejection of the Pending Patent Re-Examination dated Nov. 3, 2005 for Taiwanese patent application No. 90111701.
English language translation (and original language document) of Notice of the First Office Action dated Apr. 1, 2005 and of Notice of the Second Office Action dated Mar. 24, 2006 for Chinese patent application No. 01802203.0.
Official Action (in Chinese and English Translation thereof) from State Intellectual Property Office of P.R. China for Application No. 02817955.2.
W.E. Feely, J.C. Imhof and C.M. Stein, Polymer Engineering and Science, vol. 26, No. 16, pp. 1101-1104 (Mid-Sep. 1983).
H. Ito and C.G. Wilson, Polymer Engineering and Science, vol. 23, No. 18. pp. 1012-1018 (Dec. 1983).
Kodama et al., “Synthesis of Novel Fluoropolymer for 157nm Photoresists by Cyclo-polymerization”, Proc. SPIE vol. 5690, p. 76-pp. 83 (2002).
Mori, CAPLUS AN1994:617650.
Skofronick et al CAPLUS AN 1969:492865.
Tran et al., “Metal-Catalized Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results”, Macromolecules vol. 35, pp. 6539-pp. 6549 (2002).
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration (Form PCT/ISA/220), Searching Authority, or the Declaration (Form PCT/ISA/220), and Written Opinion of the International Searching Authority (Form PCT/ISA/237) for PCT/IB2008/000908 dated Jun. 19, 2009, which corresponds to U.S. Appl. No. 11/697,804.
U.S. Appl. No. 12/451,150, filed Oct. 27, 2009, Sung-Eun Hong et al.
Form PCT/ISA/220, Form PCT/ISA/210, and Form PCT/ISA/237 for PCT/IB2009/005975 dated Sep. 22, 2009, which corresponds to this patent application.
Machine Language English Abstract and Translation from JPO of JP 2008-255124 A, which is equivalent of WO 2007/013230 A1.
English Language Abstract of WO 2007/013230 A1 from Database CAPLU Sentered Feb. 1, 2007, Chemical Abstracts Service, AN 2007:114002 (XP-002545404).
International Search Report (Form PCT/ISA/210) for PCT/JP2008/058341 dated Nov. 13, 2008, which corresponds to U.S.
Cao Yi
Dammel Ralph R.
Hong Sung Eun
Thiyagarajan Muthiah
AZ Electronic Materials USA Corp.
Chu John S
Jain Sangya
LandOfFree
Composition for coating over a photoresist pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for coating over a photoresist pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for coating over a photoresist pattern will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4194389