Composition for chemical milling refractory metals

Compositions – Etching or brightening compositions – Inorganic acid containing

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156 18, 252 794, C09K 1306, C09K 1308, C23F 100

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active

039444961

ABSTRACT:
This application describes a composition and a process of chemically milling refractory metals and their alloys. The composition comprises a combination of nitric acid, hydrofluoric acid, and phosphoric acid, and preferably includes a derivative of carbonic acid, such as carbamide. The composition is particularly useful in the chemical milling of beta titanium, alpha beta titanium, and alpha titanium alloys. Use of the composition of this invention results in reduced tolerances in the chemically milled article and also reduced hydrogen absorption in the titanium part which is chemically milled.

REFERENCES:
patent: 2981610 (1961-04-01), Snyder et al.
patent: 3052582 (1962-09-01), Snyder
patent: 3753815 (1973-08-01), Burton et al.
patent: 3788914 (1974-01-01), Gumbelevicius

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