Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Processes of preparing a desired or intentional composition...
Reexamination Certificate
2008-04-29
2008-04-29
Smith, Duane (Department: 1797)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Processes of preparing a desired or intentional composition...
C430S271100, C430S270100, C430S910000, C430S327000, C524S238000, C524S319000, C524S165000, C526S206000, C526S214000, C526S225000, C526S236000
Reexamination Certificate
active
07365115
ABSTRACT:
An anti-reflective coating film is formed by applying on a chemically amplified photoresist film an anti-reflective coating composition comprising an alkali-soluble fluorine-containing polymer, an acid, an amine and a solvent capable of dissolving these components and having a pH of 7 or less. The formed anti-reflective coating film can serve to prevent multiple reflections within the photoresist film, increase the amount of reduction in thickness of the photoresist film upon development with a developer after exposure, and form a pattern having a rectangular cross-sectional pattern and not having T-top or round top.
REFERENCES:
patent: 5118585 (1992-06-01), Schwaim et al.
patent: 5216135 (1993-06-01), Urano et al.
patent: 5272042 (1993-12-01), Allen et al.
patent: 5326675 (1994-07-01), Niki et al.
patent: 5468589 (1995-11-01), Urano et al.
patent: 5631314 (1997-05-01), Wakiya et al.
patent: 5814694 (1998-09-01), Watanabe et al.
patent: 6465161 (2002-10-01), Kang et al.
patent: 6692892 (2004-02-01), Takano et al.
patent: 2004/0023156 (2004-02-01), McGinness et al.
patent: 0 723 677 (2000-03-01), None
patent: 1 026 208 (2000-08-01), None
patent: 0 366 590 (2001-03-01), None
patent: 60-038821 (1985-02-01), None
patent: 60-263141 (1985-12-01), None
patent: 62-062520 (1987-03-01), None
patent: 62-062521 (1987-03-01), None
patent: 2-19847 (1990-01-01), None
patent: 2-209977 (1990-08-01), None
patent: 3-206458 (1991-09-01), None
patent: 4-211258 (1992-08-01), None
patent: 05-074700 (1993-03-01), None
patent: 05-088598 (1993-04-01), None
patent: 5-249682 (1993-09-01), None
patent: 06-118630 (1994-04-01), None
patent: 06-148896 (1994-05-01), None
patent: 07-234514 (1995-09-01), None
patent: 08-044066 (1996-02-01), None
patent: 08-305032 (1996-11-01), None
patent: 09-050129 (1997-02-01), None
patent: 09-090615 (1997-04-01), None
patent: 09-236915 (1997-09-01), None
patent: 10-301268 (1998-11-01), None
patent: 11-124531 (1999-05-01), None
patent: 11-124531 (1999-11-01), None
patent: 2001-133984 (2001-05-01), None
patent: 2002-227660 (2002-08-01), None
patent: WO 95/10798 (1995-04-01), None
English Language Abstract of JP 2001-133984.
Office Action, and English Language Translation, for JP 2002-195582.
Office Action for SG 200407376-3.
English Language abstract of JP 05-074700, Mar. 26, 1993.
English language abstract of JP 05-088598, Apr. 9, 1993.
English Language abstract of JP 06-118630, Apr. 1994.
English Language abstract of JP 06-148896, May 1994.
English Language abstract of JP 07-234514, Sep. 5, 1995.
English Language abstract of JP 08-044066, Feb. 16, 1996.
English Language abstract of JP 08-305032, Nov. 22, 1996.
English Language abstract of JP 09-050129, Feb. 18, 1997.
English Language abstract of JP 09-090615, Apr. 4, 1997.
English Language abstract of JP 09-236915, Sep. 9, 1997.
English Language abstract of JP 10-301268, Nov. 1998.
English Language abstract of JP 11-124531, May 1999.
English Language abstract of JP 60-038821, Feb. 28, 1985.
English Language abstract of JP 60-263141, Dec. 26, 1985.
English Language abstract of JP 62-062520, Mar. 19, 1987.
English Language abstract of JP 62-062521, Mar. 19, 1987.
English Language abstract of JP 2002-227660, Aug. 14, 2002.
Ito et al., “Chemical Amplification in the Design of Dry Developing Resist Materials”, Polymer Engineering And Science vol. 23, No. 18, pp. 1012-1018 (1983).
Machine English Language Translation of JP 05-072700, Mar. 1993.
Machie English Language Translation of JP 05-088598, Apr. 1993.
Machine English Language Translation of JP 06-118630, Apr. 28, 1994.
Machine English Language Translation of JP 06-148896, May 1994.
Machine English Language Translation of JP 07-234514, Sep. 1995.
Machine English Language Translation of JP 08-044066, Feb. 1996.
Machine English Language Translation of JP 08-305032, Nov. 1995.
Machine English Language Translation of JP 09-050129, Feb. 1997.
Machine English Language Translation of JP 09-090615, Apr. 1997.
Machine English Language Translation of JP 10-301268, Nov. 1998.
Machine English Language Translation of JP 11-124531, May 1999.
English Language Abstract of JP 2001-133984, May 2001.
Office Action, and English Language Translation, for JP 2002-195582, Apr. 2002.
Office Action for SG 200407376-3, Mailing Date: Apr. 2006.
Akiyama Yasushi
Takano Yusuke
AZ Electronic Materials USA Corp.
Jain Sangya
Smith Duane
Wu Ives
LandOfFree
Composition for antireflection coating and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for antireflection coating and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for antireflection coating and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2747236