Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2000-11-06
2002-04-02
Ogden, Necholus (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S152000, C510S155000, C510S446000, C510S447000
Reexamination Certificate
active
06365560
ABSTRACT:
BACKGROUND OF THE INVENTION
Basic skin cleansing activities have been long addressed by the personal care industry. Removing soil from the skin is a worldwide requirement of the consumer population that has been met by the available skin cleansing products. The consumer population is now looking for additional benefits beyond basic cleansing. Skin conditioning i.e. smoothness, texture, etc., is a desired characteristic and brought about through the presence of emollients in a basic skin cleansing composition. Additionally, the presence of components which bring about an antibacterial effect on the skin are now becoming ever more acceptable and desirable by the consumer population.
In order for these effects to be perceived by the consumer or measurable to various degrees, there must be contact of the active ingredient which brings about the effect with the skin. Therefore, increased deposition of an active ingredient on the skin is certainly desirable since a greater effect should normally follow and less active ingredient may be employed, thereby potentially reducing the cost of the formulation.
A new way of increasing the deposition of hydrophobic active ingredients from skin cleansing compositions has been discovered. This provides both liquid and solid skin cleansing compositions with the ability to deliver greater quantities of active ingredients to the skin during an ordinary skin cleansing procedure and/or maintain them on the skin for a longer period of time.
SUMMARY OF THE INVENTION
In accordance with the invention, there is a personal cleansing composition which comprises
a. a skin cleansing effective amount of a surfactant or mixture of surfactants,
b. a hydrophobic active component in quantities which brings about a perceived effect on the skin, said effect selected from the group consisting of skin conditioning, skin protection from irritants and antibacterial agents,
c. a hydrocarbon containing component, and
d. a cationic polymer the quantities of c and d selected so that the effect on the skin by component b is enhanced over the additive effects of c and d alone.
Still further, there is a method for using the above identified composition for skin cleansing.
A further composition is a personal cleansing composition which comprises
a. about 9 to about 90 wt. % of a surfactant or mixture of surfactants,
b. about 0.01 to about 10 wt. % of a hydrophobic active component in quantities which brings about a perceived effect on the skin, said effect selected from the group consisting of skin conditioning, skin protection from irritants and antibacterial agents,
c. about 0.5 to about 5 wt. % of a hydrocarbon containing component, and
d. about 0.01 to about 3 wt. % of a cationic polymer.
DETAILED DESCRIPTION OF THE INVENTION
The compositions of this invention bring about an increased perceived effect on the skin from known positive skin affecting materials. Although not to be bound by this theory, it is believed that this perceived effect is brought about through the increased deposition of the skin affecting material on the skin surface, or in such juxtaposition to the skin surface that the material has an opportunity to provide its effect. Thus, more of the material is available to perform its specific action. Additionally, the material may be held on the surface of the skin or in juxtaposition to the skin for a longer period of time, thereby providing an effect for a greater duration of time. Both of these effects may be present or only one. It is clear therefore, that there are at least two parameters which are involved in the increased perceived effect of the material on the skin. The first effect is the activity of the material, for example, the degree of skin conditioning, the reduced irritation of the skin and the reduced quantity of measurable bacteria present on the skin. The second effect is the duration of such activity as measured by time. This latter effect is particularly important for a product whose composition is designed to be removed from the skin such as a facial and hand wash, a shower gel, and the like.
In line with the cleansing activity of the composition, there must be a skin cleansing effective amount of a surfactant present in the composition. Soap, a long chain alkyl or alkenyl, branched or normal carboxylic acid salt such as sodium, potassium, ammonium or substituted ammonium salt, can be present in the composition. Exemplary of long chain alkyl or alkenyl are from about 8 to about 22 carbon atoms in length, specifically about 10 to about 20 carbon atoms in length, more specifically alkyl and most specifically normal, or normal with little branching. Small quantities of olefinic bond(s) may be present in the predominantly alkyl sections, particularly if the source of the “alkyl” group is obtained from a natural product such as tallow, coconut oil and the like.
Other surfactants can be present in the composition as well. Examples of such surfactants are the anionic, amphoteric, nonionic and cationic surfactants. Examples of anionic zwitterionic surfactants include but are not limited to alkyl sulfates, anionic acyl sarcosinates, methyl acyl taurates, N-acyl glutamates, acyl isethionates, alkyl sulfosuccinates, alkyl phosphate esters, ethoxylated alkyl phosphate esters, trideceth sulfates, protein condensates, mixtures of ethoxylated alkyl sulfates and the like.
Alkyl chains for these surfactants are C
8
-C
22
, preferably C
10
-C
18
, more preferably C
12
-C
14
.
Anionic nonsoap surfactants can be exemplified by the alkali metal salts of organic sulfate having in their molecular structure an alkyl radical containing from about 8 to about 22 carbon atoms and a sulfonic acid or sulfuric acid ester radical (included in the term alkyl is the alkyl portion of higher acyl radicals). Preferred are the sodium, ammonium, potassium or triethanolamine alkyl sulfates, especially those obtained by sulfating the higher alcohols (C
8
-C
18
carbon atoms), sodium coconut oil fatty acid monoglyceride sulfates and sulfonates; sodium or potassium salts of sulfuric acid esters of the reaction product of 1 mole of a higher fatty alcohol (e.g., tallow or coconut oil alcohols) and 1 to 12 moles of ethylene oxide; sodium or potassium salts of alkyl phenol ethylene oxide ether sulfate with 1 to 10 units of ethylene oxide per molecule and in which the alkyl radicals contain from 8 to 12 carbon atoms, sodium alkyl glyceryl ether sulfonates; the reaction product of fatty acids having from 10 to 22 carbon atoms esterified with isethionic acid and neutralized with sodium hydroxide; water soluble salts of condensation products of fatty acids with sarcosine; and others known in the art.
Zwitterionic surfactants can be exemplified by those which can be broadly described as derivatives of aliphatic quaternary ammonium, phosphonium, and sulfonium compounds, in which the aliphatic radicals can be straight chain or branched and wherein one of the aliphatic substituents contains from about 8 to 18 carbon atoms and one contains an anionic water-solubilizing group, e.g., carboxy, sulfonate, sulfate, phosphate, or phosphonate. A general formula for these compounds is:
wherein R
2
contains an alkyl, alkenyl, or hydroxy alkyl radical of from about 8 to about 18 carbon atoms, from 0 to about 10 ethylene oxide moieties and from 0 to 1 glyceryl moiety; Y is selected from the group consisting of nitrogen, phosphorus, and sulfur atoms; R3 is an alkyl or monohydroxyalkyl group containing 1 to about 3 carbon atoms; X is 1 when Y is a sulfur atom and 2 when Y is a nitrogen or phosphorus atom, R
4
is an alkylene or hydroxyalkylene of from 0 to about 4 carbon atoms and Z is a radical selected from the group consisting of carboxylate, sulfonate, sulfate, phosphonate, and phosphate groups.
Examples include: 4-[N,N-di(2-hydroxyethyl)-N-octadecylammonio]-butane-1-carboxylate; 5-[S-3-hydroxypropyl-S-hexadecylsulfonio] -3 hydroxypentane-1-sulfate; 3-[P,P-P-diethyl-P 3,6,9 trioxatetradecyl-phosphonio]-2-hydroxypropane-1-phosphate; 3-[N,N-dipropyl-N-3 dodecoxy-2-hy
Chopra Suman K.
Chupa Janine A.
Parle-Schmitz Elizabeth K.
Patel Amrit
Robbins Clarence
Barancik Martin B.
Colgate-Palmolive Company
Ogden Necholus
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