Drug – bio-affecting and body treating compositions – Topical sun or radiation screening – or tanning preparations
Patent
1996-11-22
1998-06-02
Dodson, Shelley A.
Drug, bio-affecting and body treating compositions
Topical sun or radiation screening, or tanning preparations
424 60, 424400, 424401, 424450, 424451, A61K 742, A61K 744, A61K 700
Patent
active
057595267
ABSTRACT:
A composition comprising an aqueous dispersion of lipid vesicles encapsulating at least one compound which screens out UV radiation and contains at least one free or at least partially neutralized acidic function, wherein the lipid vesicles have a lipid membrane formed from at least one nonionic amphiphilic lipid (A) or from at least one saturated hydrocarbon ionic amphiphilic lipid (B) having an iodine number of less than 10, and from at least one totally neutralized ionic amphiphilic lipid (C) is disclosed. The use of this composition as a base for products to care for the skin, the scalp, the hair, the eyelashes or the eyebrows, as a base for make-up products, and more particularly as bases for compositions to protect the human epidermis, the hair, the eyelashes or the eyebrows against ultraviolet rays are also disclosed.
REFERENCES:
patent: 4165336 (1979-08-01), Bouillon et al.
patent: 4217344 (1980-08-01), Vanlerberghe et al.
English Language Derwent Abstract of EP-A-559502 no date.
English Language Derwent Abstract of EP-390682 no date.
English Language Derwent Abstract of EP-582503 no date.
Legret Sylvie
Ribier, deceased Alain
Ribier, executor Roger
Simonnet Jean-Thierry
"L'Oreal"
Dodson Shelley A.
LandOfFree
Composition comprising an aqueous dispersion of lipid vesicles e does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition comprising an aqueous dispersion of lipid vesicles e, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition comprising an aqueous dispersion of lipid vesicles e will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1456503