Composition and process for cleaning metals

Compositions – Fluent dielectric – N-containing

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25217414, 25217415, 25217416, 25217422, C11D 330, C11D 732, C11D 3075

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active

052502309

ABSTRACT:
The oil splitting properties of otherwise conventional alkaline cleaning solutions that comprise water, an alkaline builder, and a general surfactant component are substantially improved by adding a special, nonionic, surfactant component that has an HLB value in the range from 1 to 7.9 and is made up of molecules that contain at least two nitrogen atoms per molecule and have a chemical structure that can be made by sequential additions of ethylene oxide followed by propylene oxide, or of propylene oxide followed by ethylene oxide, to core molecules that are most preferably 1,2-diaminoethane but more generally may be any organic amine that contains at least two primary and/or secondary amino groups and contains not more than 22 carbon atoms.

REFERENCES:
patent: 3696057 (1972-11-01), Schussler et al.
patent: 4474682 (1984-10-01), Billenstein et al.
patent: 4554099 (1985-11-01), Clarke
patent: 4826618 (1989-05-01), Borseth et al.
patent: 5076954 (1991-12-01), Loth et al.
patent: 5108643 (1992-04-01), Loth et al.
patent: 5110494 (1992-05-01), Beck
patent: 5126068 (1992-06-01), Burke et al.
D. Meyer--Surfactant Science and Technology . . . pp. 236-237.

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