Composition and process for chemically stripping metallic deposi

Details Composition and process for chemically stripping metallic deposi Composition and process for chemically stripping metallic deposi

1979-11-15

1981-01-13

Weinblatt, Mayer

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

252 792, 252142, 134 3, 134 41, 156664, 156666, C23G 104, C23G 108

Patent

active

042448336

ABSTRACT:
An improved process and composition for chemically stripping metallic deposits from a substrate, and particularly, from the contact tips of electroplating racks and like apparatus to maintain proper operating efficiency thereof. The improved composition and method employs an aqueous acidic solution containing nitric acid, chloride ions and manganous ions present in an amount sufficient to accelerate the initiation of and the rate of stripping of the metallic deposits. The method and composition are applicable for chemically stripping a variety of metallic deposits at stripping rates substantially higher than those heretofore attainable with prior art compositions and techniques.

REFERENCES:
patent: 3015630 (1962-01-01), Thompson et al.
patent: 3836473 (1974-09-01), Kay et al.
patent: 3856694 (1974-12-01), Becking
patent: 4108680 (1978-08-01), Barr, Jr.

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