Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2004-12-16
2008-10-07
Del Cotto, Gregory R (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S255000, C510S264000, C510S370000, C510S499000, C510S505000
Reexamination Certificate
active
07432233
ABSTRACT:
The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.
REFERENCES:
patent: 3640825 (1972-02-01), Kolaian
patent: 4210498 (1980-07-01), Tamura et al.
patent: 5022926 (1991-06-01), Kreh et al.
patent: 5280746 (1994-01-01), Siegel
patent: 5290361 (1994-03-01), Hayashida et al.
patent: 5302311 (1994-04-01), Sugihara et al.
patent: 5466389 (1995-11-01), Ilardi et al.
patent: 5840127 (1998-11-01), Hayashida et al.
patent: 5885362 (1999-03-01), Morinaga et al.
patent: 6066609 (2000-05-01), Martin et al.
patent: 6319885 (2001-11-01), Lee et al.
patent: 6508887 (2003-01-01), Park et al.
patent: 6599370 (2003-07-01), Skee
patent: 2004/0198621 (2004-10-01), Mun et al.
patent: 264 012 0 (1912-11-01), None
patent: 0 346 139 (1989-12-01), None
patent: 1 029 703 (2000-08-01), None
patent: WO 03/068713 (2003-08-01), None
Database WPI, Section CH, Week 198626 Derwent Publications Ltd. London, GB AN 1986-166778, XP002320262 and JP 61 100919 A (Nichicon Capacitor Ltd) May 19, 1986 Abstract.
European Search Report in European Appln. No. EP 04 44 7282, completed on Mar. 11, 2005.
Mertens, et al.,Proc. Of the 5thInternat. Symp. On Cleaning Techonology in Semiconductor Device ManufacturingPV97-35 (1997).
Mertens, et al.Proc. Of the 8thInternat. Symp on Silicon Materials Science and TechnologyPV98-1 (1998).
M.J. Rosen,Surfactants and Interfacial phenomena, 2ndEdition, John Wiley and Son, New York, (1989).
Beilsteins Handbuch der Organischen Chemie, IV. Ausg, Grundewer, BD 11, S. 294 Springer Berlin 1928.
De Waele Rita
Vos Rita
Del Cotto Gregory R
Interuniversitair Microelektronica Centrum (IMEC)
Knobbe Martens Olson & Bear LLP
LandOfFree
Composition and method for treating a semiconductor substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition and method for treating a semiconductor substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition and method for treating a semiconductor substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4018002