Composition and method for treating a semiconductor substrate

Details Composition and method for treating a semiconductor substrate Composition and method for treating a semiconductor substrate

2006-06-27

2008-09-09

Del Cotto, Gregory R (Department: 1796)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C510S175000, C510S255000, C510S264000, C510S370000, C510S499000, C510S505000

Reexamination Certificate

active

07422019

ABSTRACT:
The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.

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