Etching a substrate: processes – Nongaseous phase etching of substrate – Substrate is multilayered
Patent
1998-05-11
1999-07-27
Utech, Benjamin
Etching a substrate: processes
Nongaseous phase etching of substrate
Substrate is multilayered
252 791, 252 792, 252 794, 156656, C23D 100
Patent
active
059285290
ABSTRACT:
A composition and method for stripping tin or tin-lead alloys, and any underlying copper-tin intermetallic, from a copper surface. The composition includes an aqueous solution of approximately 5-60% nitric acid by weight, approximately 0.5-30% ferric nitrate by weight, and a nitric acid stabilizer selected from the group consisting of an amino-triazole, an amino-isoxazole, and a linear amino sulfone in the form H.sub.2 N-SO.sub.2 -R, where R is any alkyl or benzene group, wherein the stabilizer is present at a concentration sufficient to inhibit exothermic conditions, emission of toxic NOx gas, and copper attack. A soluble source of halogen ion, such as hydrochloric acid, can be added to the composition to yield a uniform, reflective, bright pink copper appearance, and to further reduce sludge formation. In addition, sludge formation can be eliminated by adding a soluble source of sulfate ion (SO.sub.4.sup.-2) to the composition.
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Lovell Charles N.
Morton International Inc.
Umez-Eronini Lynette T.
Utech Benjamin
White Gerald K.
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