Composition and method for selectively etching a silicon nitride

Details Composition and method for selectively etching a silicon nitride Composition and method for selectively etching a silicon nitride

1998-08-28

2000-12-19

Utech, Benjamin L.

Compositions

Etching or brightening compositions

252 792, 252 793, 438745, 438753, 438756, 438757, C09K 1308

Patent

active

061623709

ABSTRACT:
The invention relates to an aqueous phosphoric acid etch bath composition with a readily soluble silicon containing composition. The baths are used in the etching step of composite semiconductor device manufacturing.

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patent: 5472562 (1995-12-01), Ziger
patent: 5641383 (1997-06-01), Jun
patent: 5830375 (1998-11-01), Huang et al.

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