Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2005-01-25
2005-01-25
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C008S142000, CD32S010000, C134S002000, C134S012000, C134S031000, C438S745000
Reexamination Certificate
active
06846789
ABSTRACT:
Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.
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Davenhall Leisa B.
Rubin James B.
Taylor Craig M. V.
Borkowsky Samuel L.
Gemma Morrison Bennett
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