Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2006-08-15
2006-08-15
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C134S003000
Reexamination Certificate
active
07091165
ABSTRACT:
A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
REFERENCES:
patent: 3653931 (1972-04-01), Borchert et al.
patent: 4803008 (1989-02-01), Ciolino et al.
patent: 5401326 (1995-03-01), Mihelic et al.
patent: 5705089 (1998-01-01), Sugihara et al.
patent: 6173776 (2001-01-01), Furman et al.
patent: 6228823 (2001-05-01), Morinaga et al.
patent: 6265309 (2001-07-01), Gotoh et al.
patent: 6274296 (2001-08-01), Chu
patent: 6350560 (2002-02-01), Sahbari
patent: 6585825 (2003-07-01), Skee
patent: 6716803 (2004-04-01), Kakizawa et al.
patent: 6869921 (2005-03-01), Koito et al.
Chae Gee-Sung
Hwang Yong-Sup
Jang Suk-Chang
Jo Gyoo-Chul
Kim Seong-Bae
Dongjin Semichem Co., Ltd.
LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
Webb Gregory
LandOfFree
Composition and method for removing copper-compatible resist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition and method for removing copper-compatible resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition and method for removing copper-compatible resist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3665942