Composition and method for preparing chemically-resistant...

Etching a substrate: processes – Forming or treating electrical conductor article

Reexamination Certificate

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C216S105000, C216S106000, C106S287110, C106S287130, C106S287150, C106S287190, C106S287200, C106S287230, C106S287240, C106S287300, C106S287320, C148S022000, C252S079100, C252S079200, C252S079400, C427S098800, C427S099200, C427S118000

Reexamination Certificate

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07108795

ABSTRACT:
The invention is directed to a method and composition for providing chemically-resistant roughened copper surfaces suitable for subsequent multilayer lamination. In one embodiment, a smooth copper surface is contacted with an adhesion promoting composition under conditions effective to provide a roughened copper surface, the adhesion promoting composition comprising an oxidizer, a pH adjuster, a topography modifier, and a sulfur-containing coating stabilizer. In another embodiment, a smooth copper surface is contacted with an adhesion promoting composition under conditions effective to provide a roughened copper surface, the adhesion promoting composition comprising an oxidizer, a pH adjuster, and a topography modifier. Then, in a subsequent step, the roughened copper surface is contacted with an acid resistance promoting composition.

REFERENCES:
patent: 3756957 (1973-09-01), Shiga
patent: 4236957 (1980-12-01), Valayil et al.
patent: 4512818 (1985-04-01), Valayil et al.
patent: 4642161 (1987-02-01), Akahoshi et al.
patent: 5006200 (1991-04-01), Chen
patent: 5073456 (1991-12-01), Palladino
patent: 5221418 (1993-06-01), Cordani
patent: 5492595 (1996-02-01), Carano et al.
patent: 5532094 (1996-07-01), Arimura et al.
patent: 5800859 (1998-09-01), Price et al.
patent: 5837155 (1998-11-01), Inagaki et al.
patent: 5861076 (1999-01-01), Adlam et al.
patent: 5869130 (1999-02-01), Ferrier
patent: 5910255 (1999-06-01), Noddin
patent: 5931996 (1999-08-01), Reisser et al.
patent: 5985998 (1999-11-01), Sommerfeld et al.
patent: 6054061 (2000-04-01), Bayes et al.
patent: 6063306 (2000-05-01), Kaufman et al.
patent: 6117795 (2000-09-01), Pasch
patent: 6136502 (2000-10-01), Satoshi et al.
patent: 6146701 (2000-11-01), Ferrier
patent: 6162503 (2000-12-01), Ferrier
patent: 6716281 (2004-04-01), Bernards et al.
patent: 2001/0000884 (2001-05-01), Miller et al.
patent: 2002/0084441 (2002-07-01), Bernards et al.
patent: WO 98/19217 (1998-05-01), None
patent: WO 99/40764 (1999-08-01), None
patent: WO 99/40765 (1999-08-01), None
patent: WO 01/29289 (2001-04-01), None
patent: WO 01/29290 (2001-04-01), None

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