Composition and method for polishing rigid disks

Details Composition and method for polishing rigid disks Composition and method for polishing rigid disks

1997-04-18

2000-01-18

Raymond, Richard L.

Compositions

Oxidative bleachant, oxidant containing, or generative

216 53, 2521821, 25218232, 2521834, 510175, C09K 1300

Patent

active

06015506&

ABSTRACT:
A method for polishing computer rigid disks comprising bringing at least one surface of the rigid disk into contact with a polishing pad and applying a dispersion to the rigid disk to give a polished rigid disk having an rms roughness less than about 1.4 nm. Also disclosed is a dispersion and polishing slurry for polishing rigid disks.

REFERENCES:
patent: 3342652 (1967-09-01), Reisman et al.
patent: 3385682 (1968-05-01), Lowen
patent: 3429080 (1969-02-01), Lachapelle
patent: 3668131 (1972-06-01), Banush et al.
patent: 3877938 (1975-04-01), Shinozaki et al.
patent: 3930870 (1976-01-01), Basi
patent: 4011099 (1977-03-01), Gutsche
patent: 4021263 (1977-05-01), Rosenblum
patent: 4225349 (1980-09-01), Koshiyama et al.
patent: 4251384 (1981-02-01), Rooney
patent: 4412886 (1983-11-01), Sakaguchi et al.
patent: 4426366 (1984-01-01), McCandlish et al.
patent: 4475981 (1984-10-01), Rea
patent: 4476102 (1984-10-01), McCandlish et al.
patent: 4529410 (1985-07-01), Khaladji et al.
patent: 4581042 (1986-04-01), Willmore
patent: 4601755 (1986-07-01), Melard et al.
patent: 4671851 (1987-06-01), Beyer et al.
patent: 4696697 (1987-09-01), Kitano et al.
patent: 4769046 (1988-09-01), Senda et al.
patent: 4789648 (1988-12-01), Chow et al.
patent: 4885106 (1989-12-01), Lapham et al.
patent: 4910155 (1990-03-01), Cote et al.
patent: 4915710 (1990-04-01), Miyazki et al.
patent: 4929257 (1990-05-01), Miyazaki et al.
patent: 4935039 (1990-06-01), Miyazaki et al.
patent: 4944836 (1990-07-01), Beyer et al.
patent: 4956015 (1990-09-01), Okajimia et al.
patent: 4956313 (1990-09-01), Cote et al.
patent: 4959113 (1990-09-01), Roberts
patent: 4992135 (1991-02-01), Doan
patent: 5084071 (1992-01-01), Nenadic et al.
patent: 5114437 (1992-05-01), Takeuchi et al.
patent: 5137544 (1992-08-01), Medellin
patent: 5139570 (1992-08-01), Castrogiovanni et al.
patent: 5157876 (1992-10-01), Medellin
patent: 5209816 (1993-05-01), Yu et al.
patent: 5225034 (1993-07-01), Yu et al.
patent: 5226955 (1993-07-01), Owaki
patent: 5244534 (1993-09-01), Yu et al.
patent: 5340370 (1994-08-01), Cadien
patent: 5354490 (1994-10-01), Yu et al.
patent: 5366542 (1994-11-01), Yamada et al.
patent: 5387457 (1995-02-01), Sato
patent: 5391258 (1995-02-01), Brancaleoni et al.
patent: 5441788 (1995-08-01), Bloomquist et al.
patent: 5469312 (1995-11-01), Watanabe et al.
patent: 5476606 (1995-12-01), Brancaleoni et al.
patent: 5527423 (1996-06-01), Neville et al.
patent: 5575837 (1996-11-01), Kodama et al.
patent: 5622896 (1997-04-01), Knotter et al.
patent: 5645736 (1997-07-01), Allman
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5804513 (1998-09-01), Sakatani et al.
patent: 5827781 (1998-10-01), Skrovan et al.
patent: 5860848 (1999-01-01), Loncki et al.
Cabot Corporation Semi-Sperse.TM. W-A355 Polishing Slurry for Tungsten CMP product literature Apr. 1995.
Cabot Corporation Semi-Sperse.TM. FE-10 Oxidizer Solution for Tungsten CMP product literature Apr. 1995.
Cabot Corporation General Information on Semi-Sperse.TM. W-A355 Polishing Slurry for Tungsten CMP product literature, Apr. 1995.
Patent Abstracts of Japan, publication No. 6342782, publication date Nov. 11, 1988.
Dupont Oxone.RTM. Monopersulfate Compound, Oxone Monopersulfate Compound, pp. 1-6 (1994).

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