Composition and method for polishing a composite of silica and s

Details Composition and method for polishing a composite of silica and s Composition and method for polishing a composite of silica and s

1997-02-19

1998-04-14

Breneman, R. Bruce

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

216 89, 216 97, H01L 21304

Patent

active

057388008

ABSTRACT:
A composition is provided for polishing a composite comprised of silica and silicon nitride comprising: an aqueous medium, abrasive particles, a surfactant, and a compound which complexes with the silica and silicon nitride wherein the complexing agent has has two or more functional groups each having a dissociable proton, the functional groups being the same or different.

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patent: 5445996 (1995-08-01), Kodera et al.
patent: 5476606 (1995-12-01), Brancaleoni et al.
patent: 5502007 (1996-03-01), Murase

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