Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating
Reexamination Certificate
2006-09-12
2006-09-12
Wong, Edna (Department: 1753)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly single metal coating
C205S238000, C205S239000, C205S253000, C205S259000, C205S267000, C205S271000, C205S296000, C205S093000, C205S102000, C205S105000, C205S123000, C205S125000, C106S001250, C106S001260
Reexamination Certificate
active
07105082
ABSTRACT:
A composition for electrodeposition of a metal on a work piece, which electrodeposition is conducted at an electrodeposition temperature, is provided. The composition comprises a metal salt, a polymer suppressor having a cloud point, an accelerator and an electrolyte. If the cloud point is greater than the electrodeposition temperature, an anion is also present in an amount sufficient to lower the cloud point of the polymer suppressor to a temperature approximately no greater than the electrodeposition temperature.
REFERENCES:
patent: 6444110 (2002-09-01), Barstad et al.
patent: 6531046 (2003-03-01), Morrissey et al.
patent: 2001/0015321 (2001-08-01), Reid et al.
patent: 2004/0074775 (2004-04-01), Herdman et al.
patent: 2005/0056537 (2005-03-01), Chen et al.
patent: 2005/0061679 (2005-03-01), Hardikar
patent: 58081988 (1983-05-01), None
patent: 63079991 (1988-04-01), None
patent: 2000248397 (2000-09-01), None
BASF, “Surfactants, Pluronic & Tetronic” (no month, 1999), pp. 1-37.
BASF, “Pluronic® L62D Block Copolymer Surfactant”, Technical Bulletin, © no month, 2002, page 1.
BASF, Surfactants, Pluronic & Tetronic (no month, 1999), pp. 1-37.
Consson, Lindman, Holmberg, and Kronberg,Surfactants and Polymers In Aqueous Solution, 176-180 (1998), no month.
BASF Corporation, Surfactants(Pluronic&Tetronic) (1999), no month.
Ingrassia Fisher & Lorenz P.C.
Novellus Systems Inc.
Wong Edna
LandOfFree
Composition and method for electrodeposition of metal on a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition and method for electrodeposition of metal on a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition and method for electrodeposition of metal on a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3596212