Composition and method for chemically etching copper elements

Details Composition and method for chemically etching copper elements Composition and method for chemically etching copper elements

1975-07-09

1977-02-08

Van Horn, Charles E.

Specialized metallurgical processes, compositions for use therei

Processes

Free metal or alloy reductant contains magnesium

156642, 156666, 252 792, 252 793, 252 794, 423 35, C22B 1512

Patent

active

040070379

ABSTRACT:
This invention resides in compositions and methods for chemically etching copper elements. The etching solution of this invention is composed of materials which can be easily regenerated and the copper metal etched from the copper element easily recovered. The etching solution is also of a type that is substantially self-sustaining.

REFERENCES:
patent: 2908557 (1959-10-01), Black et al.
patent: 3367875 (1968-02-01), Sherer et al.
patent: 3772105 (1973-11-01), Shipley
patent: 3816306 (1976-06-01), Roy

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