Composite sputtering method

Details Composite sputtering method Composite sputtering method

1976-09-17

1977-11-29

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192F, 29630E, C23C 1500

Patent

active

040604713

ABSTRACT:
A method for depositing a layer in which the concentration of constituent materials varies through its thickness employs a radio frequency sputtering apparatus. The deposition apparatus has a target composed of different component materials for the layer. The substrate is placed within the deposition apparatus and moved to various positions with respect to the target during the deposition.

REFERENCES:
patent: 3324019 (1967-06-01), Laegrid et al.
patent: 3460976 (1969-08-01), Allen
patent: 3864239 (1975-02-01), Fletcher et al.
patent: 3920533 (1975-11-01), Pompei
patent: 3945902 (1976-03-01), Hawrylo et al.
patent: 3945903 (1976-03-01), Svendor et al.
patent: 3985635 (1976-10-01), Adam et al.

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