Composite patterning integration

Details Composite patterning integration Composite patterning integration

2005-08-02

2005-08-02

Letscher, Geraldine (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S290000, C430S394000, C430S322000, C430S323000, C430S324000

Reexamination Certificate

active

06924070

ABSTRACT:
Method and structure for masking are disclosed. In one embodiment, a thin layer of radiation sensitive material is combined with another layer of radiation opaque material with different etch selectivity to facilitate a multi-stage patterning treatment of an underlying mask layer and a resultant critical dimension in the patterned mask which may be less than that available using conventional patterning techniques.

REFERENCES:
patent: 6656644 (2003-12-01), Hasegawa et al.

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