Composite pattern for monitoring various defects of...

Details Composite pattern for monitoring various defects of... Composite pattern for monitoring various defects of...

2007-12-11

2007-12-11

Louie, Wai-Sing (Department: 2814)

Semiconductor device manufacturing: process

With measuring or testing

C438S017000, C438S018000

Reexamination Certificate

active

11324168

ABSTRACT:
A composite monitor is capable of determining a variety of defects of a semiconductor device. The composite monitor has an isolation region in a well region, an active region pattern in the well region and defined by the isolation region, and a metal line pattern partially overlying the active region pattern. The composite monitor further has an optional well region pad electrically coupled to the well region and separated from the metal line pattern, an active region pad electrically coupled to the active region pattern and separated from both the metal line pattern and the well region pad, a metal line pad electrically coupled to the metal line pattern and separated from both the well region pad and the active region pad, and a first contact between the active region pattern and the metal line pattern to provide an electrical path therebetween.

REFERENCES:
patent: 5614750 (1997-03-01), Ellul et al.
patent: 6452252 (2002-09-01), Nagatomo
patent: 6906363 (2005-06-01), Suzuki
patent: 6908857 (2005-06-01), Akamatsu et al.
patent: 7074711 (2006-07-01), Lee
Yoo, Hung Ryul et al.; Field Translator Monitoring Pattern for Shallow Trench Isolation Defects In Semiconductor Device; U.S. Appl. No. 11/293,660, filed Dec. 2, 2005.

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