Composite metal material and method for manufacturing the...

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Composite having voids in a component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C428S312200, C428S312800, C428S314800, C428S315700, C428S317900, C428S319100, C428S457000

Reexamination Certificate

active

06855408

ABSTRACT:
A composite metallic material1according to the invention is used for, e.g., electrolytic capacitors, and includes a metallic material substrate10and a high polymer thin layer11having a fine pattern12formed on at least one surface of the substrate10by self-organization. This high polymer thin film11is formed by, for example, drying hydrophobic organic solvent solution of high polymer compound. By subjecting this composite metallic material1to etching processing, etching pits are formed uniformly with high density based on the fine pattern.

REFERENCES:
patent: 5895263 (1999-04-01), Carter et al.
patent: 6565763 (2003-05-01), Asakawa et al.
patent: 0 459 461 (1991-12-01), None
patent: 58-34925 (1983-07-01), None
patent: 61-51818 (1986-03-01), None
patent: 3-122260 (1991-05-01), None
patent: 8-253878 (1996-10-01), None
patent: 2000-251236 (2000-09-01), None
T. Gokawachi, Toshiba Review, vol. 56, No. 10, pp. 66-67, “Nanomaterial”, Oct. 1, 2001 (with Partial English translation).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Composite metal material and method for manufacturing the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composite metal material and method for manufacturing the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composite metal material and method for manufacturing the... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3475402

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.