Composite material with chemically vapor deposited layer of sili

Details Composite material with chemically vapor deposited layer of sili Composite material with chemically vapor deposited layer of sili

1991-03-21

1992-04-21

Robinson, Ellis P.

Stock material or miscellaneous articles

Structurally defined web or sheet

Continuous and nonuniform or irregular surface on layer or...

427249, 427255, 428408, 428409, 428446, 428698, B32B 3300

Patent

active

051066874

ABSTRACT:
A composite material for use as a construction material for high energy density beam reflectors and for other purposes, comprising a substrate and a chemically vapor deposited layer of silicon carbide formed thereon, wherein the crystal faces in said chemically vapor deposited layer of silicon carbide are oriented to the (220) plane as indicated by Miller indices.

REFERENCES:
patent: 4608326 (1986-08-01), Neukermans et al.
patent: 4634635 (1987-01-01), Shiraishi et al.
patent: 4783368 (1988-11-01), Yamamoto et al.
patent: 4843040 (1989-06-01), Oda et al.
patent: 4941942 (1990-07-01), Bruns et al.

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