Chemistry: electrical current producing apparatus – product – and – Having magnetic field feature
Reexamination Certificate
2005-09-06
2005-09-06
Cantelmo, Gregg (Department: 1745)
Chemistry: electrical current producing apparatus, product, and
Having magnetic field feature
C429S006000, C429S047000, C429S047000, C429S047000, C429S050000
Reexamination Certificate
active
06939630
ABSTRACT:
A composite electrode for reducing oxygen that provides the quasi four-electron reduction at selectivity of nearly 100% is provided. The composite electrode includes an electrochemical catalyst A that produces hydrogen peroxide by reducing oxygen and a catalyst B that decomposes the produced hydrogen peroxide to oxygen.
REFERENCES:
patent: 4407907 (1983-10-01), Takamura et al.
patent: 4655887 (1987-04-01), Oda et al.
patent: 5824429 (1998-10-01), Das et al.
patent: 6335112 (2002-01-01), Asukabe et al.
patent: 6465128 (2002-10-01), Sunstrom et al.
patent: 63-21315 (1988-05-01), None
patent: 2-30141 (1990-07-01), None
patent: 2-30142 (1990-07-01), None
patent: 6-73060 (1994-03-01), None
patent: 11-253811 (1999-09-01), None
patent: 2000106203 (2000-04-01), None
Mao et al. “A novel alkaline air electrode based on a combined use of cobalt hexadecafluoro-phthalocyanine and manganese oxide”, Electrochemical Acta 49 (2004), pp. 2515-2521.
Gojkovic “Heat-treated iron(III) tetramethoxyphenyl porphyrin chloride supported on high-area carbon as an electrocatalyts for oxygen reduction”, Electrochemica Acta 45 (1999), pp. 889-897.
“ELECTROCATALYSIS”, edited by Jacek Upkowski and Philip N. Ross, published by Wiley-Vch, pp. 204-205 and 232-235 (1998).
Ohsaka Takeo
Sotomura Tadashi
LandOfFree
Composite electrode for reducing oxygen does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composite electrode for reducing oxygen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composite electrode for reducing oxygen will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3385136