Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2011-01-04
2011-01-04
Neckel, Alexa D (Department: 1723)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298350, C204S298360, C204S298390, C204S298410, C204S298010, C204S298120, C118S7230MA
Reexamination Certificate
active
07862694
ABSTRACT:
A composite coating device includes first to third processing chambers. The first processing chamber performs an ion beam etching as a pretreatment process in which an ion beam is irradiated on a surface of a magnetic head at a predetermined angle and the surface is removed for a predetermined depth. The second processing chamber performs a magnetron sputter deposition as a shock absorbing coating formation process in which a shock absorbing coating is formed on the pretreated surface. The third processing chamber performs an electron cyclotron resonance plasma chemical vapor epitaxy or a cathode arc discharge deposition as an overcoat formation process in which an overcoat is formed on the shock absorbing coating. A preparation chamber communicates with the first to third processing chambers through opening and closing devices for transferring the magnetic head.
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Konishi Yoshiyuki
Suzuki Masayasu
Ueda Masahiro
Band Michael
Kanesaka Manabu
Neckel Alexa D
Shimadzu Corporation
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