Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-02-29
1999-03-09
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429813, C23C 1434
Patent
active
058795243
ABSTRACT:
A composite backing plate (34) for a backing plate-target assembly (41) having a core of structural material (36) with a front face (42) and/or a rear face (44) of a different material laminated thereto. The composite backing plate (35) has the desired mechanical properties of a solid copper backing plate, for example, strength and stiffness, but is preferably less than half the density of a solid copper backing plate. The core material is preferably aluminum; the front face is preferably copper; and the rear face is preferably either copper or an organic material.
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Hurwitt Steven
Reiss Ira
Marerials Research Corporation
McDonald Rodney G.
Nguyen Nam
Sony Corporation
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