Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-02-15
2005-02-15
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298020, C204S298120, C204S298140, C204S298150, C118S715000, C118S720000, C118S7230ER, C118S728000
Reexamination Certificate
active
06855236
ABSTRACT:
A component for a vacuum deposition apparatus comprises a component body and a spray deposit formed on a surface of a component body. A spray deposit has surface roughness in which a mean spacing S of tops of local peak of profile is in the range from 50 to 150 μm, and distances to a bottom of profile valley line Rv and to a top of profile peak line are in the ranges from 20 to 70 μm, respectively. Furthermore, a spray deposit has a low hardness coat selected from an Al base spray deposit of Hv 30 (Vickers hardness) or less, a Cu base spray deposit of Hv 100 or less, a Ni base spray deposit of Hv 200 or less, a Ti base spray deposit of Hv 300 or less, a Mo base spray deposit of Hv 300 or less and a W base spray deposit of Hv 500 or less. Such component for a vacuum deposition apparatus may suppress, with stability and effectiveness, peeling of deposition material adhering on a component during deposition. In addition, the number of apparatus cleaning and of exchange of components may be largely reduced. A target comprises a similar spray deposit. A vacuum deposition apparatus is one in which above component for a vacuum deposition apparatus is applied in a holder of a sample to be deposited, a deposition material source holder, a preventive component and so on.
REFERENCES:
patent: 6235120 (2001-05-01), Bang et al.
patent: 6250251 (2001-06-01), Akiyama et al.
patent: 60-26659 (1985-02-01), None
patent: 61-56277 (1986-03-01), None
patent: 63-161163 (1988-07-01), None
patent: 63-243269 (1988-10-01), None
patent: 4-268065 (1992-09-01), None
patent: 6-196437 (1994-07-01), None
patent: 7-62519 (1995-03-01), None
patent: 8-176816 (1996-07-01), None
patent: 8-277461 (1996-10-01), None
patent: 9-87834 (1997-03-01), None
patent: 09-272965 (1997-10-01), None
patent: 9-275082 (1997-10-01), None
patent: 10-204604 (1998-08-01), None
patent: 10-273339 (1998-10-01), None
patent: 11-345780 (1999-12-01), None
Machine translation of 11-345780.*
Machine translation of 09-272965.
Nakamura Takashi
Sato Michio
Yabe Yoichiro
Kabushiki Kaisha Toshiba
McDonald Rodney G.
LandOfFree
Components for vacuum deposition apparatus and vacuum... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Components for vacuum deposition apparatus and vacuum..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Components for vacuum deposition apparatus and vacuum... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3492162