Etching a substrate: processes – Mechanically shaping – deforming – or abrading of substrate
Reexamination Certificate
2006-07-27
2009-02-03
Culbert, Roberts (Department: 1792)
Etching a substrate: processes
Mechanically shaping, deforming, or abrading of substrate
C264S029100, C216S053000, C216S056000
Reexamination Certificate
active
07485239
ABSTRACT:
Disclosed herein is an inner tube of glass-like carbon for CVD apparatus and a process for production thereof. The inner tube has its surface roughened without increase in metal impurities which cause particles. It has improved adhesion to CVD deposit film and also has a high degree of roundness. The surface roughness (on both the inner and outer surfaces) is 0.1-10 μm measured according to JIS B0601. The concentration of metal impurities (iron, copper, chromium, sodium, potassium, calcium, magnesium, and aluminum) in the surface is less than 50×1010atoms/cm2.
REFERENCES:
patent: 5324411 (1994-06-01), Ichishima et al.
patent: 5807416 (1998-09-01), Kemmochi et al.
patent: 5833754 (1998-11-01), Ito et al.
patent: 5853523 (1998-12-01), Machida et al.
patent: 5951814 (1999-09-01), Saito et al.
patent: 5993596 (1999-11-01), Uwai et al.
patent: 6383333 (2002-05-01), Haino et al.
patent: 6660093 (2003-12-01), Hamaguchi et al.
patent: 2002/0017242 (2002-02-01), Hamaguchi et al.
patent: 803896 (1997-10-01), None
patent: 63017294 (1988-01-01), None
patent: 64-47019 (1989-02-01), None
patent: 6-86662 (1994-11-01), None
patent: 7-53635 (1995-06-01), None
patent: 08-102443 (1996-04-01), None
patent: 9-7954 (1997-01-01), None
patent: 9-208316 (1997-08-01), None
patent: 10-209064 (1998-08-01), None
patent: 10-218664 (1998-08-01), None
patent: 11-189470 (1999-07-01), None
patent: 11-189471 (1999-07-01), None
patent: 2001-332504 (2001-11-01), None
patent: 2001-335366 (2001-12-01), None
patent: 2001-342068 (2001-12-01), None
patent: 2002-43397 (2002-02-01), None
Culbert Roberts
Kobe Steel Ltd
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
LandOfFree
Component of glass-like carbon for CVD apparatus and process... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Component of glass-like carbon for CVD apparatus and process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Component of glass-like carbon for CVD apparatus and process... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4116732